Optimization of Short Channel Effect With Arsenic Halo Implant through Polysilicon Gate : Semiconductors

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 2001-09-15

著者

• Chang Chun

  Department Of Electronics Engineering National Chiao Tung University

• Chang C‐y

  Department Of Electronics Engineering National Chiao Tung University

• CHANG Chun-Yen

  Department of Electronics Engineering, National Chiao Tung University

• Chang Chun-yen

  Instiute Of Electronics National Chiao-tang University

• Chang Chun-yen

  Department Of The Electro-optical Engineering National Chiao Tung University

• Chou J‐w

  United Microelectronics Corp. Technology Development Division

• Chou Jih-wen

  United Microelectronics Corporation Device Engineering Department Specially Technology Division

• CHEN Coming

  Depanment of Electronic Engineering, National Chiao-Tung University

• CHANG Chun-Yen

  Depanment of Electronic Engineering, National Chiao-Tung University

• CHENG Yao-Chin

  United Microelectronics Corp.

• Chang C‐y

  Department Of Electronics Engineering Nation Chiao Tung University

• Chou Jih-Wen

  United Microelectronics Corp.

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