Characterization of Polycrystalline Silicon Thin Film Transistors Fabricated by Ultrahigh-Vacuum Chemical Vapor Deposition and Chemical Mechanical Polishing

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概要

• 論文の詳細を見る
• Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
• 1997-07-01

著者

• CHANG Chun-Yen

  Department of Electronics Engineering, National Chiao Tung University

• Chien C‐h

  Department Of Electronics Engineering And Institute Of Electronics National Chiao Tung University

• CHEN Liang-Po

  National Nano Device Laboratory

• LEI Tan

  Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University

• Lin Horng-chih

  Department Of Electronics Engineering And Institute Of Electronics National Chiao Tung University

• Chang Chun-yen

  Department Of Electronics Engineering And Institute Of Electronics National Chiao Tung University

• LIN Hsiao-Yi

  Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University

• CHENG Juing-Yi

  Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University

• TSENG Hua-Chou

  Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University

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