The Impact of Titanium Silicide on the Contact Resistance for Shallow Junction Formed by Out-Diffusion of Arsenic from Polysilicon
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1993-01-30
著者
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LEE Chung
Department of Anesthesiology and Pain Medicine, Asan Medical Center, University of Ulsan College of
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Lei T
National Chiao Tung Univ. Hsinchu Twn
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YANG Wen
Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University
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LEI Tan
Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University
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HUANG Cheng
Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University
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Lee Chung
Department Of Electronics Engineering National Chiao Tung University
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Lei Tan
Department Of Electronic Engineering National Chiao Tung University
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Lee C
Department Of Electronics Engineering National Chiao Tung University
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Yang Wen
Department Of Electronics Engineering And Institute Of Electronics National Chiao Tung University
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Lei Tan.
National Nano Device Laboratory:department Of Electronics Engineering And Institute Of Electronics N
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Huang C
National Chiao Tung Univ. Hsinchu Twn
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Huang Cheng
Department Of Electronics Engineering And Institute Of Electronics National Chiao Tung University
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Lee Chung
Department Of Anesthesiology And Pain Medicine Asan Medical Center University Of Ulsan College Of Me
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Yang Wen
Department of Electronic Engineering, Feng Chia University, Taichung, Taiwan
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