Optimum Conditions for Novel One-Step Cleaning Method for Pre-Gate Oxide Cleaning Using Robust Design Methodology
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2000-10-15
著者
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LEI Tan
Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University
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CHAO Tien
National Nano Device Laboratories
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Chao Tien
National Device Laboratory
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Lei Tan
Department Of Electronics Engineering And Institute Of Electronics National Chiao-tung University
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Lei Tan
Department Of Electronic Engineering National Chiao Tung University
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Pan Tung
Department Of Electronics Engineering And Institute Of Electronics National Chiao-tung University
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LIAW Ming
National Nano Device Laboratories
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LU Chih
Merck-Kanto, Advanced Chemicals Ltd.
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Lu Chih
Merck-kanto Advanced Chemicals Ltd.
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