Improvement of Thin Oxides Thermally Grown on the Reactive-Ion-Etched Silicon Substrates
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1995-05-15
著者
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Cheng H
Department Of Electronics Engineering And Institute Of Electronics National Chiao Tung University
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Chen W
National Nano Device Laboratory
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Chen Wen
National Nano Device Laboratory
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CHAO Tien
National Nano Device Laboratories
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Chao Tien
National Device Laboratory
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Chao Tien
National Nano Device Laboratory
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Ueng Shin
Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University
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Wang Ping
Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University
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Kang Tzong
Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University
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Dai Bao
National Nano Device Laboratory
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Cheng Hung
Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University
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Wang P
Department Of Electronics Engineering And Institute Of Electronics National Chiao Tung University
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Ueng S
Department Of Electronics Engineering And Institute Of Electronics National Chiao Tung University
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Kang T
Department Of Electronics Engineering And Institute Of Electronics National Chiao Tung University
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Wang Ping
Department Of Electronics Engineering And Institute Of Electronics National Chiao Tung University
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Chen Wen
National Amorphous And Nanocrystalline Alloys Engineering Research Center Central Iron And Steel Res
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Wang Ping
Department Of Chemical And Environmental Engineering Beijing Technology And Business University
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Wang Ping
Department of Applied Physics, University of Miyazaki, 1-1 Gakuen-Kibanadai-Nishi, Miyazaki 889-2192, Japan
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