Effects of Postetching Treatments on Electrical Characteristics of Thermal Oxides on Reactive-Ion-Etched Silicon Substrates

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1995-09-15

著者

• CHAO Tien

  National Nano Device Laboratories

• Chao Tien

  National Device Laboratory

• Wang Ping

  Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University

• Wang Ping

  Department Of Electronics Engineering And Institute Of Electronics National Chiao Tung University

• Ueng Shih

  Department Of Electronics Engineering And Institute Of Electronics National Chiao Tung University

• Cheng Huang

  Department Of Electronics Engineering And Institute Of Electronics National Chiao Tung University

• KAN Tzong

  Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University

• Kan Tzong

  Department Of Electronics Engineering And Institute Of Electronics National Chiao Tung University

• Wang Ping

  Department Of Chemical And Environmental Engineering Beijing Technology And Business University

• Wang Ping

  Department of Applied Physics, University of Miyazaki, 1-1 Gakuen-Kibanadai-Nishi, Miyazaki 889-2192, Japan

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