Improvement of Reliability of MOSFET's with N_2O Nitrided Gate Oxide and N_2O Polysilicon Gate Reoxidation
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概要
- 論文の詳細を見る
- 1997-09-16
著者
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CHANG C.
Department of Physics, National Cheng Kung University
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LEI Tan
Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University
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Lei Tan
Department Of Electronics Engineering National Chiao Tung University
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Lei Tan
Department Of Electronic Engineering National Chiao Tung University
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Lai Chao
National Nano Device Laboratory
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CHAO T.
National Nano Device Laboratory
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LEE Cheng
Department of Electronics Engineering, National Chiao Tung University
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HUANG T.
National Nano Device Laboratory
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Chang C.
Department Of Anatomy Taipei Medical University
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Chang C.
Department Of Electronics Engineering National Chiao Tung University
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Lee Cheng
Department Of Electronics Engineering National Chiao Tung University
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