Improvement of Ultra-Thin 3.3nm Thick Oxide for Co-Salicide Process Using NF3 Annealed Poly-Si Gate

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概要

• 論文の詳細を見る
• 1998-09-07

著者

• CHANG T.

  Department of Electronics Engineering, National Chiao-Tung University

• CHAO T.

  National Nano Device Laboratory

• HUANG T.

  National Nano Device Laboratory

• LEI T.

  Department of Chemistry, Fudan University

• CHOU S.

  Special Technology Division, United Microelectronics Corporation

• LIN H.

  National Nano Device Lab.

• Chou S.

  Special Technology Division United Microelectronics Corporation

• Lin H.

  Institute Of Mechatronics Engineering National Taipei University Of Technology

• CHEN S.

  Air Products Asia

• TUAN A.

  Air Products Asia

• CHOU S.

  San Fu Co Ltd.

• Lei T.

  Department Of Electronics Engineering National Chiao Tung University

• Chang T.

  Department Of Electronics Engineering National Chiao-tung University

関連論文

• DC Hot Carrier Reliability at Elevated Temperatures for nMOSFETs Using 0.13μm Technology
• Temperature Effect on Off-State Drain Leakage Current in a Hot-Carrier Stressed n-MOSFET
• A Comparative Study of Interface Trap Induced Drain Leakage Current in Various n-MOSFET Structures
• The Polarity Dependence of Soft-Breakdown Characterization for Ultra-Thin Gate Oxides Affected by Nitrogen and Fluorine
• Improvement of Reliability of MOSFET's with N_2O Nitrided Gate Oxide and N_2O Polysilicon Gate Reoxidation
• New Catalyst of γ- Al_2O_3 Supported SO_4^/ZrO_2 for n - Butane Isomerization
• Suppression of Boron Penetration in P^+-Poly-Si Gate Metal-Oxide-Semiconductor Transistor Using Nitrogen Implantation
• Mechanism and Optimization of Nitrogen Co-Implant for Suppressing Boron Penetration in P^+-Poly-Si Gate of PMOSFET's
• Oxide Thickness Dependence of Hot Carrier Stress Induced Drain Leakage Current Degradation in Thin-Oxide n-MOSFET's
• Reduced Reverse Narrow Channel Effect in Thin SOI nMOSFET's
• High Performance Sub-0.1μm Dynamic Threshold MOSFET Using Indium Channel Implantation
• Mismatches under the Impact of Hot Carrier Stress in 0.15μm Technology
• Negative Feedback Regulation of Pancreatic Exocrine Secretion in Guinea Pigs
• New Mechanisms and the Characterization of Plasma Charging Enhanced Hot Carrier Effect in Deep-Submicron N-MOSFET's
• Improvement of Ultra-Thin 3.3nm Thick Oxide for Co-Salicide Process Using NF3 Annealed Poly-Si Gate
• Red blood cell substitutes : past, present and future

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