Lin H. | Institute Of Mechatronics Engineering National Taipei University Of Technology
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概要
- LIN H. C.の詳細を見る
- 同名の論文著者
- Institute Of Mechatronics Engineering National Taipei University Of Technologyの論文著者
関連著者
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LEI T.
Department of Chemistry, Fudan University
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CHOU S.
Special Technology Division, United Microelectronics Corporation
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Chou S.
Special Technology Division United Microelectronics Corporation
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Lin H.
Institute Of Mechatronics Engineering National Taipei University Of Technology
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Lei T.
Department Of Electronics Engineering National Chiao Tung University
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Chen H.
Institute of Mechanics and Materials, University of California, San Diego
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LIN H.
Institute of Physics, Academia Sinica
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Jhou Z.
Institute Of Mechatronics Engineering National Taipei University Of Technology
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CHEN S.
Institute of Mechatronics Engineering, National Taipei University of Technology
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LIN J.
Special Technology Division, United Microelectronics Corporation
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KO J.
Special Technology Division, United Microelectronics Corporation
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HAUNG H.
Institute of Mechatronics Engineering, National Taipei University of Technology
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Haung H.
Institute Of Mechatronics Engineering National Taipei University Of Technology
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Lin H.
Institute Of Materials Science And Engineering National Sun Yat-sen University
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Chen H.
Institute Of Crystal Materials Shandong University
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Chen S.
Institute Of Mechatronics Engineering National Taipei University Of Technology
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Lin J.
Special Technology Division United Microelectronics Corporation
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CHANG T.
Department of Electronics Engineering, National Chiao-Tung University
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CHAO T.
National Nano Device Laboratory
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HUANG T.
National Nano Device Laboratory
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LIN H.
National Nano Device Lab.
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CHEN S.
Air Products Asia
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TUAN A.
Air Products Asia
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CHOU S.
San Fu Co Ltd.
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Chang T.
Department Of Electronics Engineering National Chiao-tung University
著作論文
- DC Hot Carrier Reliability at Elevated Temperatures for nMOSFETs Using 0.13μm Technology
- Mismatches under the Impact of Hot Carrier Stress in 0.15μm Technology
- Improvement of Ultra-Thin 3.3nm Thick Oxide for Co-Salicide Process Using NF3 Annealed Poly-Si Gate