CHAO T. | National Nano Device Laboratory
スポンサーリンク
概要
関連著者
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CHAO T.
National Nano Device Laboratory
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CHANG C.
Department of Physics, National Cheng Kung University
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Chang C.
Department Of Anatomy Taipei Medical University
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Chao T
National Chiao Tung Univ. Hsinchu Twn
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Lei T
National Chiao Tung Univ. Hsinchu Twn
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Chao T‐s
Department Of Electrophysics National Chiao Tung University
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Chao Tien
National Device Laboratory
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HUANG T.
National Nano Device Laboratory
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Chang C.
Department Of Electronic Engineering National Chiao Tung University
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CHANG C.
National Taiwan University Hospital
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CHU C.
National Taiwan University Hospital
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CHANG S.
Department of Electrical Engineering, National Cheng Kung University
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Lei Tan.
National Nano Device Laboratory:department Of Electronics Engineering And Institute Of Electronics N
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CHIEN C.
Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University
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HAO C.
Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University
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LIAW M.
National Nano Device Laboratories
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LEI T.
National Nano Device Laboratories
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Chang C
National Chiao Tung Univ. Twn
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Liaw M
National Nano Device Lab. Hsinchu Twn
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WU S.
Department of Electronics Engineering, National Chiao Tung University
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Hsu C.
Semiconductor Technology And Application Research (star) Group Department Of Electrical Engineering
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Chang C.
National Nano Device Laboratories
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Wu S.
Department Of Electronic Engineering National Chiao Tung University
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Hao C.
Department Of Electronics Engineering And Institute Of Electronics National Chiao Tung University
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Wu S.
Department Of Anatomy And K.k. Leung Brain Research Centre Faculty Of Basic Medicine Fourth Military
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Chang S.
Department Of Electronic Engineering National Chiao Tung University
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Chao T.
National Nano Device Labs.
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Chang S.
Department Of Electrical Engineering National Cheng Kung University
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Lee Y.
Department Of Zoology National University Of Singapore
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YEH C.
Department of Electrical Engineering, Texas A&M University, College Station
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LEI Tan
Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University
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CHEN C.
Department of Physics, Faculty of Science, Tokai University
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Lei Tan
Department Of Electronics Engineering National Chiao Tung University
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Lei Tan
Department Of Electronic Engineering National Chiao Tung University
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ZOUS N.
Department of Electronics Engineering, National Chiao-Tung University
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WANG Tahui
Department of Electronics Engineering, National Chiao-Tung University
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HUANG L.
Department of Electronics Engineering, National Chiao-Tung University
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CHANG T.
Department of Electronics Engineering, National Chiao-Tung University
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Zous N.
Department Of Electronics Engineering National Chiao-tung University
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Lai Chao.
Department Of Electronic Engineering Chang Gung University
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Lai Chao
National Nano Device Laboratory
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LEE Cheng
Department of Electronics Engineering, National Chiao Tung University
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Lee Y.
Department Of Geneticopathology Department Of Radiation Biology Research Institute For Nuclear Medic
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Wang Tahui
Department Of Electronics Engineering National Chiao-tung University
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Wang Tahui
Department Of Electronic Engineering National Chiao Tung University
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CHEN T.
United Microelectronics Corp., Specialty Technology Department, Technology & Process Development Div
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SUN S.
United Microelectronics Corp., Specialty Technology Department, Technology & Process Development Div
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LIN Tony
United Microelectronics Corp., technology Development Division
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Lin Tony
United Microelectronics Corporation (umc) Central R&d Division
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Lin Tony
United Microelectronics Corp. Technology Development Division
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LEI T.
Department of Chemistry, Fudan University
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SUN W.
Semiconductor Technology and Application Research (STAR) Group, Department of Electrical Engineering
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HSU C.
Semiconductor Technology and Application Research (STAR) Group, Department of Electrical Engineering
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HUANG T.
Department of Electronics Engineering, National Chiao Tung University
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CHOU J.
United Microelectronics Corp., Technology Development Division
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CHOU S.
Special Technology Division, United Microelectronics Corporation
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Chen C.
Department Of Electrical Engineering National Central University
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LIN H.
National Nano Device Lab.
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Lee Y.
Department Of Anesthesiology Chang Gung Memorial Hospital Lin-kou Medical Center
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Chen C.
Department Of Aeronautics And Astronautics National Cheng-kung University
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Chang C.
Department Of Electronics Engineering National Chiao Tung University
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Yeh C.
Department Of Electronics Engineering National Chiao-tung University
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Chou S.
Special Technology Division United Microelectronics Corporation
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Yeh C.
Department Of Electrical Engineering Texas A&m University College Station
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Lin H.
Institute Of Mechatronics Engineering National Taipei University Of Technology
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CHEN S.
Air Products Asia
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TUAN A.
Air Products Asia
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CHOU S.
San Fu Co Ltd.
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Huang L.
Department Of Electronics Engineering National Chiao-tung University
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Chou J.
United Microelectronics Corp. Technology Development Division
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Lee Y.
Department Of Electronic Engineering National Chiao Tung University
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Lee Cheng
Department Of Electronics Engineering National Chiao Tung University
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Lei T.
Department Of Electronics Engineering National Chiao Tung University
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Chang T.
Department Of Electronics Engineering National Chiao-tung University
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Chao T.S.
National Nano Device Laboratories
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Chien C.H.
Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University
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Hao C.P.
Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University
著作論文
- The Polarity Dependence of Soft-Breakdown Characterization for Ultra-Thin Gate Oxides Affected by Nitrogen and Fluorine
- Improvement of Reliability of MOSFET's with N_2O Nitrided Gate Oxide and N_2O Polysilicon Gate Reoxidation
- Suppression of Boron Penetration in P^+-Poly-Si Gate Metal-Oxide-Semiconductor Transistor Using Nitrogen Implantation
- Mechanism and Optimization of Nitrogen Co-Implant for Suppressing Boron Penetration in P^+-Poly-Si Gate of PMOSFET's
- Oxide Thickness Dependence of Hot Carrier Stress Induced Drain Leakage Current Degradation in Thin-Oxide n-MOSFET's
- Reduced Reverse Narrow Channel Effect in Thin SOI nMOSFET's
- High Performance Sub-0.1μm Dynamic Threshold MOSFET Using Indium Channel Implantation
- Improvement of Ultra-Thin 3.3nm Thick Oxide for Co-Salicide Process Using NF3 Annealed Poly-Si Gate