Characterization of Novel HfTiO Gate Dielectrics Post-treated by NH_3 Plasma and Ultra-violet Rays
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概要
- 論文の詳細を見る
- 2005-09-13
著者
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LEE Chung
Department of Anesthesiology and Pain Medicine, Asan Medical Center, University of Ulsan College of
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Lee Jam
National Nano Device Laboratories
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Wang Jer
Nanya Technology Corporation
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Lai Chao
Department Of Electronic Engineering Chang Gung University
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Lei T
National Chiao Tung Univ. Hsinchu Twn
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LEI Tan
Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University
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WU Woei
Department of Electronic Physics, National Chiao Tung University
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Lee Chung
Department Of Electronics Engineering National Chiao Tung University
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CHIANG Kuo
Department of Electronics Engineering, National Chiao Tung University
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DE SHIE
Department of Electronics Engineering, National Chiao Tung University
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Lei Tan
Department Of Electronic Engineering National Chiao Tung University
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De Shie
Department Of Electronics Engineering National Chiao Tung University
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Wu Woei
Department Of Electronic Physics National Chiao Tung University
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Lee C
Department Of Electronics Engineering National Chiao Tung University
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Chiang Kuo
Department Of Electronics Engineering National Chiao Tung University
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Lei Tan.
National Nano Device Laboratory:department Of Electronics Engineering And Institute Of Electronics N
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Lee Chung
Department Of Anesthesiology And Pain Medicine Asan Medical Center University Of Ulsan College Of Me
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