Current Transportation Mechanism of HfO_2 Gate Dielectrics with Silicon Surface Fluorine Implantation (SSFI) in CMOS Application

Nanya Technology Corporation

Department Of Electronic Engineering Chang Gung University

Department Of Pharmaceutical Analysis China Pharmaceutical University

Department Of Electronics Engineering National Chiao Tung University

Department Of Electronic Physics National Chiao Tung University

Department Of Electrophysics National Chiac Tung University:nano Device Laboratories

Department of Electronic Physics, National Chiao Tung University

Department of Electronic Engineering, Chang Gung University

Department Of Electronic Engineering Chang Gung University

Department Of Electronic Physics National Chiao Tung University

Department of Electronic Physics, National Chiao Tung University, 1001 Ta Hsueh Rd., Hsinchu, Taiwan