Hysteresis Phenomenon Improvements of HfO_2 by CF_4 Plasma Treatment
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概要
- 論文の詳細を見る
- 2004-09-15
著者
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Wang Jer
Nanya Technology Corporation
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Lai Chao
Department Of Electronic Engineering Chang Gung University
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Fan Kung
Department Of Electronic Engineering Chang Gung University
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LIN Shian-Jyh
Nanya Technology Corporation
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WU Woei
Department of Electronic Physics, National Chiao Tung University
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Wu Woei
Department Of Electronic Physics National Chiao Tung University
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Lin Shian
Nanya Technology Corp. Technology Process Development Department
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Lin Shian-jyh
Nanya Technology Corp. Technology Process Development Department
関連論文
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- Effects of Post CF_4 Plasma Treatment on the HfO_2 Thin Film
- Hysteresis Phenomenon Improvements of HfO_2 by CF_4 Plasma Treatment
- Current Transportation Mechanism of HfO_2 Gate Dielectrics with Silicon Surface Fluorine Implantation (SSFI) in CMOS Application
- Current Transportation Mechanism and Interface States Characterization of Sputtered Gd_2O_3 Gate Dielectrics for ULSI Application
- Characterization of Novel HfTiO Gate Dielectrics Post-treated by NH_3 Plasma and Ultra-violet Rays
- Thermal Stability Improvements for HfO_2 by Fluorine Implantation
- Improvement of Reliability of Metal-Oxide Semiconductor Field-Effect Transistors with N_2O Nitrided Gate Oxide and N_2O Polysilicon Gate Reoxidation
- Characterizations of HfxMoyNz Alloys as Gate Electrodes for n- and p-Channel Metal Oxide Semiconductor Field Effect Transistors
- Effects of Post CF4 Plasma Treatment on the HfO2 Thin Film
- Negative Bias Temperature Instability of p-Channel Metal Oxide Semiconductor Field Effect Transistor with Novel HfxMoyNz Metal Gate Electrodes
- Characteristics of Fluorine Implantation for HfO2 Gate Dielectrics with High-Temperature Postdeposition Annealing
- Reoxidation after NH3 Plasma Nitridation for Multiple-Thickness Oxynitrides
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