Lin Shian | Nanya Technology Corp. Technology Process Development Department
スポンサーリンク
概要
関連著者
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Lai Chao
Department Of Electronic Engineering Chang Gung University
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Fan Kung
Department Of Electronic Engineering Chang Gung University
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Lin Shian
Nanya Technology Corp. Technology Process Development Department
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Wang Jer
Nanya Technology Corporation
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WU Woei
Department of Electronic Physics, National Chiao Tung University
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Wu Woei
Department Of Electronic Physics National Chiao Tung University
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HSU Li
Chung-Shan Institute of Science & Technology Materials & Electro-Optics Research Division
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LIN Shian-Jyh
Nanya Technology Corporation
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LIN Shian
Nanya Technology Corporation
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Lin Shian-jyh
Nanya Technology Corp. Technology Process Development Department
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Wu Woei
Department of Electronic Physics, National Chiao Tung University, 1001 Ta Hsueh Rd, Hsinchu, Taiwan
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Lee Chung
Nanya Technology Corporation, Hwa-Ya Technology Park, 669 Fu-Hsing 3rd Rd, Kueishan, Taoyuan 333, Taiwan
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Peng Hsing
Department of Electronic Engineering, Chang Gung University, 259 Wen-Hwa 1st Road, Kwei-Shan, Taoyuan 333, Taiwan
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Huang Chin
Department of Electronic Engineering, Chang Gung University, 259 Wen-Hwa 1st Road, Kwei-Shan, Taoyuan 333, Taiwan
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Fang Yu
Chung-Shan Institute of Science and Technology Materials and Electro-Optics Research Division, Lung-Tan, Taoyuan 32500, Taiwan
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Wang Hui
Chung-Shan Institute of Science and Technology Materials and Electro-Optics Research Division, Lung-Tan, Taoyuan 32500, Taiwan
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Lai Chao
Department of Electronic Engineering, Chang Gung University, 259 Wen-Hwa 1st Road, Kwei-Shan, Tao-Yuan, Taiwan
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Lai Chao
Department of Electronic Engineering, Chang Gung University, 259 Wen-Hwa 1st Road, Kwei-Shan, Taoyuan 333, Taiwan
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Hsu Li
Chung-Shan Institute of Science and Technology Materials and Electro-Optics Research Division, Lung-Tan, Taoyuan 32500, Taiwan
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Fan Kung
Department of Electronic Engineering, Chang Gung University, 259 Wen-Hwa 1st Road, Kwei-Shan, Taoyuan 333, Taiwan
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Lin Shian
Nanya Technology Corporation, Hwa-Ya Technology Park, 669 Fu-Hsing 3rd Rd, Kueishan, Taoyuan 333, Taiwan
著作論文
- Effects of Post CF_4 Plasma Treatment on the HfO_2 Thin Film
- Hysteresis Phenomenon Improvements of HfO_2 by CF_4 Plasma Treatment
- Characterizations of HfxMoyNz Alloys as Gate Electrodes for n- and p-Channel Metal Oxide Semiconductor Field Effect Transistors
- Effects of Post CF4 Plasma Treatment on the HfO2 Thin Film