Wang Jer | Nanya Technology Corporation
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概要
関連著者
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Wang Jer
Nanya Technology Corporation
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Lai Chao
Department Of Electronic Engineering Chang Gung University
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Wu Woei
Department Of Electronic Physics National Chiao Tung University
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WU Woei
Department of Electronic Physics, National Chiao Tung University
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Fan Kung
Department Of Electronic Engineering Chang Gung University
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Chao Tian
Department Of Electronic Physics National Chiao Tung University
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Lin Shian
Nanya Technology Corp. Technology Process Development Department
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Chao Tien
Department of Electronic Physics, National Chiao Tung University, 1001 Ta Hsueh Rd., Hsinchu, Taiwan
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Chao Tien
Department Of Electrophysics National Chiac Tung University:nano Device Laboratories
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LEE Chung
Department of Anesthesiology and Pain Medicine, Asan Medical Center, University of Ulsan College of
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Lee Jam
National Nano Device Laboratories
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Ma Ming
Department Of Pharmaceutical Analysis China Pharmaceutical University
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Ma Ming
Department Of Electronics Engineering National Chiao Tung University
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Lei T
National Chiao Tung Univ. Hsinchu Twn
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LEI Tan
Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University
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LIN Shian-Jyh
Nanya Technology Corporation
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LIN Shian
Nanya Technology Corporation
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Lee Chung
Department Of Electronics Engineering National Chiao Tung University
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WANG Tsui
Department of Electronic Engineering, Chang Gung University
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WANG Kuan
Department of Electronic Physics, National Chiao Tung University
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CHIANG Kuo
Department of Electronics Engineering, National Chiao Tung University
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DE SHIE
Department of Electronics Engineering, National Chiao Tung University
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Lei Tan
Department Of Electronic Engineering National Chiao Tung University
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Wang Tsui
Department Of Electronic Engineering Chang Gung University
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Wang Kuan
Department Of Electronic Physics National Chiao Tung University
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De Shie
Department Of Electronics Engineering National Chiao Tung University
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Lee C
Department Of Electronics Engineering National Chiao Tung University
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Chiang Kuo
Department Of Electronics Engineering National Chiao Tung University
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Lei Tan.
National Nano Device Laboratory:department Of Electronics Engineering And Institute Of Electronics N
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Lin Shian-jyh
Nanya Technology Corp. Technology Process Development Department
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Lee Chung
Department Of Anesthesiology And Pain Medicine Asan Medical Center University Of Ulsan College Of Me
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Wu Woei
Department of Electronic Physics, National Chiao Tung University, 1001 Ta Hsueh Rd, Hsinchu, Taiwan
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Lai Chao
Department of Electronic Engineering, Chang Gung University, 259 Wen-Hwa 1st Road, Kwei-Shan, Tao-Yuan, Taiwan
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Wu Woei
Department of Electronic Physics, National Chiao Tung University, 1001 Ta Hsueh Rd., Hsinchu, Taiwan
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Lai Chao
Department of Electronic Engineering, Chang Gung University, 259 Wen-Hwa 1st Rd., Kueishan, Taoyuan, Taiwan
著作論文
- Effects of Post CF_4 Plasma Treatment on the HfO_2 Thin Film
- Hysteresis Phenomenon Improvements of HfO_2 by CF_4 Plasma Treatment
- Current Transportation Mechanism of HfO_2 Gate Dielectrics with Silicon Surface Fluorine Implantation (SSFI) in CMOS Application
- Current Transportation Mechanism and Interface States Characterization of Sputtered Gd_2O_3 Gate Dielectrics for ULSI Application
- Characterization of Novel HfTiO Gate Dielectrics Post-treated by NH_3 Plasma and Ultra-violet Rays
- Thermal Stability Improvements for HfO_2 by Fluorine Implantation
- Effects of Post CF4 Plasma Treatment on the HfO2 Thin Film
- Characteristics of Fluorine Implantation for HfO2 Gate Dielectrics with High-Temperature Postdeposition Annealing