Hydrogen and Oxygen Plasma Effects on Polycrystalline Silicon Thin Films of Various Thicknesses
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概要
- 論文の詳細を見る
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 1997-06-01
著者
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LEE Chung
Department of Anesthesiology and Pain Medicine, Asan Medical Center, University of Ulsan College of
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WU Yi
Department of Clinical and Laboratory Medicine, Yamanashi Medical University
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LEI Tan
Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University
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Lee Chung
Department Of Electronics Engineering And Institute Of Electronics National Chiao Tung University
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Lei Tan
Department Of Electronic Engineering National Chiao Tung University
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Wu Yi
Department Of Child Health Care The Children's Hospital Of Zhejiang University School Of Medici
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Liou Bor
Department Of Computer Science And Information Engineering Wufeng Institute Of Technology
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Liou Bor
Department Of Electronics Engineering And Institute Of Electronics National Chiao Tung University
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Wu Yi
Department Of Electronics Engineering And Institute Of Electronics National Chiao Tung University
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Lee Chung
Department Of Anesthesiology And Pain Medicine Asan Medical Center University Of Ulsan College Of Me
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Wu Yi
Department Of Biology Sichuan Teachers College
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