Effects of Rapid Thermal Annealing on Cobalt Silicided p^+ poly-Si Gates Fabricated by BF^+_2 Implantation into Bilayered CoSi/a-Si Films

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1999-07-15

著者

• Jung M‐h

  Anyang Univ. Kyunggi‐do Kor

• Liu H‐w

  Nanya Technol. Corp. Taoyuan Twn

• CHENG Huang-Chung

  Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University

• Liu Han-wen

  Department Of Electronics Engineering And Institute Of Electronics National Chiao Tung University

• Cheng Huang-chung

  Department Of Electronics Engineering And Institute Of Electronics National Chiao Tang University

• JUANG Miin-Horng

  Department of Electronics Engineering, National Taiwan University of Science and Technology

• Lai Wen-Koi

  Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University

• Lai Wen-koi

  Department Of Electronics Engineering And Institute Of Electronics National Chiao Tung University

• Juang Miin-horng

  Department Of Electrical Engineering National Taiwan University Of Science And Technology

• Liu Han-Wen

  Department of Electrical Engineering and Graduate Institute of Optoelectronic Engineering, National Chung Hsing University, Taichung 402, Taiwan, R.O.C.

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