Effect of Temperature and Illumination on the Instability of a-Si:H Thin-Film Transistors under AC Gate Bias Stress : Semiconductors
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2001-04-01
著者
-
Huang C‐y
Department Of Electronic Engineering Kun Shan University Of Technology
-
Huang C‐y
National Chiao Tung Univ. Hsinchu Twn
-
Huang Chi-yen
Department Of Electronic Engineering Kun Shan University Of Technology
-
Chen H‐c
Department Of Electronics Engineering And Institute Of Electronics National Chiao Tung University
-
Cheng H‐c
National Tsing Hua Univ. Hsinchu Twn
-
Cheng Huang‐chung
Nano Electronics And Display Technology Lab. Department Of Electronics Engineering And Institute Of
-
CHENG Huang-Chung
Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University
-
Teng Teh-hung
Department Of Electronics Engineering And Institute Of Electronics Semiconductor Research Center Nat
-
Yang Cheng-jer
Department Of Electronics Engineering And Institute Of Electronics National Chiao Tung University
-
Cheng Huang-chung
Department Of Electronics Engineering And Institute Of Electronics National Chiao Tang University
-
HUANG Chun-Yao
Department of Electronics Engineering and Institute of Electronics, Semiconductor Research Center, N
-
TSENG Chang-Ho
Department of Electronics Engineering and Institute of Electronics, Semiconductor Research Center, N
-
Tseng C‐h
National Chiao Tung Univ. Hsinchu Twn
関連論文
- Microcrystalline SiC Films Grown by Electron Cyclotron Resonance Chemical Vapor Deposition at Low Temperatures
- Polymer-Stabilized Reflective Fingerprint Cholesteric Texture Grating
- Scattering Light Interference from Liquid Crystal Polymer Dispersion Films
- Diffraction from Polymer-Stabilized Cholesteric Texture Films
- Polymer Network Formed in Liquid Crystals: Polymer-Network-Induced Birefringence in Liquid Crystals
- Polymer-Dispersed Liquid Crystal Films:Interference Pattern Recording and Its Application
- A Flat Panel Display Combining a Polymer-Dispersed Liquid Crystal Film with an Electroluminescent Device
- A Quasi-planar Thin Film Field Emission Diode
- Improvement of Luminescent Uniformity via Synthesizing the Carbon Nanotubes on a Fe-Ti Co-deposited Catalytic Layer
- Field Emission Improvement through Structure of Intermixture of Long and Short Carbon Nanotubes
- Field Emission Improvement from Pillar Array of Aligned Carbon Nanotubes
- Improvement of Breakdown Field of Carbon Nanotubes by a Ti-Capping Layer on Catalyst Nanopaticles
- Constraining the Direction of Carbon Nanotubes by Oxide Capping Layer
- Improved Field-Emission Properties of Carbon Nanotube Field-Emission Arrays by Controlled Density Growth of Carbon Nanotubes
- Fabrication and Characterization of Lateral Field Emission Device Based On Carbon Nanotubes
- Effects of High-Density Oxygen Plasma Posttreatment on Field Emission Properties of Carbon Nanotube Field-Emission Displays
- Fabrication and Characterization of lateral Field Emission Device Based on Carbon Nanotubes
- Improvement of Field Emission Characteristics of Carbon Nanotubes by Excimer Laser Treatment
- Fabrication and Characterization of Carbon Nanotube Triodes
- A Field-Emission Device with Novel Self-Focus Gate Structure
- High-Performance LTPS-TFTs Fabricated by Continuous Wave Laser Annealing
- Polarization Degradation and Breakdown of Pulse-Laser-Deposited (Pb,Sr)TiO_3 Films at Low Temperatures
- Field-Emission Properties of Aligned Carbon Nanotubes
- Fabrication and Characterization of Various Carbon-Clad Silicon Microtips with Ultra-Small Tip Radii
- Effects of Helicon-Wave-Plasma Etching on the Charging Damage of Aluminum Interconnects
- Charging Damages to Gate Oxides in a Helicon O_2 Plasma
- Antenna Charging Effects on the Electrical Characteristics of Polysilicon Gate during Electron Cyclotron Resonance Etching
- Effects of Polysilicon Electron Cyclotron Resonance Etching on Electrical Characteristics of Gate Oxides
- Characteristics of Poly-Si Nanowire Thin Film Transistors with Double-Gated Structures
- Hot Carrier Degradations of Dynamic Threshold Silicon on Insulator p-Type Metal-Oxide-Semiconductor Field Effect Transistors
- Fabrication and Characterization of the Pd-Silicided Emitters for Field-Emission Devices
- Characterization and Fabrication of Chimney-Shaped Metal Field Emitters
- Fabrication and Characterization of Diamond-Clad Silicon Field Emitter Arrays
- Simulation of the Electrical Characteristics of Field Emission Triodes with Various Gate Structures
- A New Fabrication Technology for Field-Emission Triodes with Emitter-Gate Separation of 0.18 μm
- Dynamic Pattern Formation and Beam-Steering Characteristics of Cholesteric Gratings(Structure and Mechanical and Thermal Properties of Condensed Matter)
- Cholesteric Gratings Doped with a Dichroic Dye
- Studies of Second Harmonic Generation in Liquid Crystal-Polymer Mixtures
- Electrooptical Device Based on Polymer-Dispersed Liquid Crystal Films
- The Dependence of the Electrooptical Characteristics of Polymer Dispersed Liquid Crystal Films on Temperature
- Excellent Emission Characteristics of Tunneling Oxides Formed Using Ultrathin Silicon Films for Flash Memory Devices
- Electrical Characteristics of Thirn-Film Transistors with Double-Active-Layer Structure
- A New Portrayal of Oxidation of Undoped Polycrystalline Silicon Films in a Short Duration
- Low-Temperature Formation of Palladium Silicided Shallow p^+n Junctions Using Implant through Metal Technology
- Investigation of A 450V Rating Silicon-On-Insulator Lateral-Double-Diffused-Metal-Oxide-Semiconductor Fabrication by 12/25/5/40V Bipolar-Complementary Metal-Oxide-Semiconductor Double-Diffused Metal-Oxide-Semiconductor Process on Bulk Silicon Substrate
- Lateral Superjunction Reduced Surface Field Structure for the Optimization of Breakdown and Conduction Characteristics in a High-Voltage Lateral Double Diffused Metal Oxide Field Effect Transistor
- Characterizing Trench-Gate Power Metal-Oxide-Semiconductor Field Effect Transistor with Multi-Layer Dielectrics at the Trench Bottom
- Excellent Au/Ge/Pd Ohmic Contacts to n-type GaAs Using Mo/Ti as the Diffusion Barrier
- High-Performance Au/Ti/Ge/Pd Ohmic Contacts on n-Type In_Ga_P
- Investigation of a High Quality and Ultraviolet-Light Transparent Plasma-Enhanced Chemical Vapor Deposition Silicon Nitride Film for Non-Volatile Memory Application
- Generalized Interconnect Delay Time and Crosstalk Models: II. Crosstalk-Induced Delay Time Deterioration and Worst Crosstalk Models : Semiconductors
- Generalized Interconnect Delay Time and Crosstalk Models: I. Applications of Interconnect Optimization Design : Semiconductors
- Integrated Tungsten Chemical Mechanical Polishing Process Characterization for Via Plug Interconnection in Ultralarge Scale Integrated Circuits
- Novel Technique to Form Pt-Silicided Shallow p^+n Junctions Using Low-Temperature Processes
- Effects of Vacancies on the Electrical Characteristics of Metal/GaAs Schottky Contacts "A Quantitative Model"
- Thin-Film Transistors with Polycrystalline Silicon Films Prepared by Two-Step Rapid Thermal Annealing
- Effects of O_2- and N_2O-Plasma Treatments on Properties of Plasma-Enhanced-Chemical-Vapor-Deposition Tetraethylorthosilicate Oxide
- Enhanced Metalorganic Chemical Vapor Deposition Titanium Nitride Film Fabricated Using Tetrakis-Dimethylamino-Titanium for Barrier Metal Application in Sub-Half-Micron Technology
- Enhanced Extreme Ultraviolet Lithography Mask Inspection Contrast Using Fabry-Perot Type Antireflective Coating
- Diluted Low Dielectric Constant Materials as Bottom Antireflective Coating Layers for both KrF and ArF Lithography Processes
- Thermal Flow and Chemical Shrink Techniques for Sub-100 nm Contact Hole Fabrication in Electron Beam Lithography
- Reduction Substrate Alkaline Contamination by Utilizing Multi-Layer Bottom Antireflective Coating Structures in ArF Lithography
- Low Dielectric Constant Polymer Materials as Bottom Antirefiective Coating Layers for both KrF and ArF Lithography
- Characterizing Optical Properties of Self-Assembled Gold Nanoparticles for Surface Plasmon Resonance Device Applications
- Fabrication of Silicon and Germanium Nanostructures by Combination of Hydrogen Plasma Dry Etching and VLS Mechanism
- Low-Temperature Process to Improve the Leakage Current of (Ba, Sr)TiO_3 Films on Pt/TiN/Ti/Si Substrates
- The Effects of Post Excimer Laser Annealing on (Ba,Sr)TiO_3 Thin Films at Low Substrate Temperatures
- Effects of Post-Oxygen Plasma Treatment on Pt/(Ba,Sr)TiO_3/Pt Capacitors at Low Substrate Temperatures
- Effect of Temperature and Illumination on the Instability of a-Si:H Thin-Film Transistors under AC Gate Bias Stress : Semiconductors
- Turnaround Phenomenon of Threshold Voltage Shifts in Amorphous Silicon Thin Film Transistors under Negative Bias Stress
- The Instability Mechanisms of Hydrogenated Amorphous Silicon Thin Film Transistors under AC Bias Stress
- 籾殻炭の炭素熱還元法によるゲーレナイト(Ca_2Al_2SiO_7)の生成
- The Instability Characteristics of Amorphous Silicon Thin Film Transistors with Various Interfacial and Bulk Defect States
- Second Harmonic Generation Studies of Polymer-Stabilized Cholesteric Texture Films
- Plasma Passivation Effects on Polycrystalline Silicon Thin-Film Transistors Utilizing Nitrous Oxide Plasma
- Growth and field emission characteristics of carbon nanotubes using Co/Cr/Al multilayer catalyst
- Characterizing Optical Properties of Self-Assembled Gold Nanoparticles for Surface Plasmon Resonance Device Applications
- Effects of Rapid Thermal Annealing on Cobalt Silicided p^+ poly-Si Gates Fabricated by BF^+_2 Implantation into Bilayered CoSi/a-Si Films
- High-Performance Superthin Oxide/Nitride/Oxide Stacked Dielectrics Formed by Low-Pressure Oxidation of Ultrathin Nitride
- High Field-Emission Stability of Offset-Thin-Film Transistor-Controlled Al-Doped Zinc Oxide Nanowires
- Reverse Annealing of Arsenic-Implanted Low-Pressure Chemical Vapor Deposition (LPCVD) Amorphous-Silicon Films
- Lateral Superjunction Reduced Surface Field Structure for the Optimization of Breakdown and Conduction Characteristics in a High-Voltage Lateral Double Diffused Metal Oxide Field Effect Transistor
- Investigation of A 450 V Rating Silicon-On-Insulator Lateral-Double-Diffused-Metal–Oxide– Semiconductor Fabrication by 12/25/5/40 V Bipolar-Complementary Metal–Oxide–Semiconductor Double-Diffused Metal–Oxide–Semiconductor Process on Bulk Silicon Substrate
- Effects of Post-Oxygen Plasma Treatment on Pt/(Ba,Sr)TiO3/Pt Capacitors at Low Substrate Temperatures
- Polarization Degradation and Breakdown of Pulse-Laser-Deposited (Pb,Sr)TiO3 Films at Low Temperatures
- The Reliability Improvements of Carbon Nanotubes Emitters by Utilizing an Fe–Ti Codeposited Catalyst
- High-Performance Excimer-Laser-Crystallized Polycrystalline Silicon Thin-Film Transistors with the Pre-Patterned Recessed Channel
- Dependence of Ferroelectric Characteristics on the Deposition Temperature of (Pb,Sr)TiO3 Films
- Characterizing Trench-Gate Power Metal–Oxide–Semiconductor Field Effect Transistor with Multi-Layer Dielectrics at the Trench Bottom
- A Quasi-Planar Thin Film Field Emission Diode
- Improved Field-Emission Properties of Carbon Nanotube Field-Emission Arrays by Controlled Density Growth of Carbon Nanotubes
- Planar Texture Improvement in Cholesteric Liquid Crystal Cells
- Diffraction from Polymer-Stabilized Cholesteric Texture Films
- Improvement in Planar Orientation of the Polymer-Stabilized Cholesteric Liquid Crystal Cells
- Fabrication and Characterization of Carbon Nanotube Triodes
- Growth and Field Emission Characteristics of Carbon Nanotubes Using Co/Cr/Al Multilayer Catalyst
- Fabrication of Novel Three-Step Drift-Doped Low-Temperature Polycrystalline Silicon Lateral Double-Diffusion Metal–Oxide–Semiconductor Using Excimer Laser Crystallization
- Fabrication and Characterization of lateral Field Emission Device Based on Carbon Nanotubes
- Cholesteric Gratings Doped with a Dichroic Dye
- Polymer Network Formed in Liquid Crystals: Polymer-Network-Induced Birefringence in Liquid Crystals