Reduction Substrate Alkaline Contamination by Utilizing Multi-Layer Bottom Antireflective Coating Structures in ArF Lithography
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2002-06-30
著者
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Chen H‐l
Department Of Materials Science And Engineering National Taiwan University
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Cheng H‐c
National Tsing Hua Univ. Hsinchu Twn
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Cheng Huang‐chung
Nano Electronics And Display Technology Lab. Department Of Electronics Engineering And Institute Of
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KO Fu-Hsiang
National Nano Device Lab.
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CHEN Hsuen-Li
National Nano Device Laboratories
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CHEN Ben-Chang
National Nano Device Laboratory
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Ko F‐h
National Nano Device Lab.
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Chen Hsuen-li
National Nano Device Lab.
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SHIH Ming-Chang
National Nano Device Lab.
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HSIEH Ching-Feng
National Nano Device Lab.
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Chen Ben-chang
National University Of Kaohsiung
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