Diluted Low Dielectric Constant Materials as Bottom Antireflective Coating Layers for both KrF and ArF Lithography Processes
スポンサーリンク
概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2003-06-30
著者
-
Chen H‐c
Department Of Electronics Engineering And Institute Of Electronics National Chiao Tung University
-
Cheng H‐c
National Tsing Hua Univ. Hsinchu Twn
-
Cheng Huang‐chung
Nano Electronics And Display Technology Lab. Department Of Electronics Engineering And Institute Of
-
KO Fu-Hsiang
National Nano Device Lab.
-
CHEN Hsuen-Li
National Nano Device Laboratories
-
Chu Tien-chi
Yuanpei Institute Of Science And Technology
-
Ko F‐h
National Nano Device Lab.
-
Chen Hsuen-li
National Nano Device Lab.
-
CHENG Hsu-Chun
National Nano Device Lab.
-
CHAO Wen-Chi
National Nano Device Lab.
-
CHU Tien-Chi
Department of Nuclear Science, National Tsing Hua University
関連論文
- A Quasi-planar Thin Film Field Emission Diode
- Improvement of Luminescent Uniformity via Synthesizing the Carbon Nanotubes on a Fe-Ti Co-deposited Catalytic Layer
- Field Emission Improvement through Structure of Intermixture of Long and Short Carbon Nanotubes
- Field Emission Improvement from Pillar Array of Aligned Carbon Nanotubes
- Improvement of Breakdown Field of Carbon Nanotubes by a Ti-Capping Layer on Catalyst Nanopaticles
- Constraining the Direction of Carbon Nanotubes by Oxide Capping Layer
- Improved Field-Emission Properties of Carbon Nanotube Field-Emission Arrays by Controlled Density Growth of Carbon Nanotubes
- Fabrication and Characterization of Lateral Field Emission Device Based On Carbon Nanotubes
- Effects of High-Density Oxygen Plasma Posttreatment on Field Emission Properties of Carbon Nanotube Field-Emission Displays
- Fabrication and Characterization of lateral Field Emission Device Based on Carbon Nanotubes
- Improvement of Field Emission Characteristics of Carbon Nanotubes by Excimer Laser Treatment
- Fabrication and Characterization of Carbon Nanotube Triodes
- Microwave Heating for the Preparation of Nanometer Gold Particles
- Synthesis of Nanometer-Sized Poly (methyl methacrylate) Polymer Network by Gold Nanoparticle Template
- A Field-Emission Device with Novel Self-Focus Gate Structure
- High-Performance LTPS-TFTs Fabricated by Continuous Wave Laser Annealing
- Polarization Degradation and Breakdown of Pulse-Laser-Deposited (Pb,Sr)TiO_3 Films at Low Temperatures
- Field-Emission Properties of Aligned Carbon Nanotubes
- Fabrication and Characterization of Various Carbon-Clad Silicon Microtips with Ultra-Small Tip Radii
- Effects of Helicon-Wave-Plasma Etching on the Charging Damage of Aluminum Interconnects
- Charging Damages to Gate Oxides in a Helicon O_2 Plasma
- Antenna Charging Effects on the Electrical Characteristics of Polysilicon Gate during Electron Cyclotron Resonance Etching
- Effects of Polysilicon Electron Cyclotron Resonance Etching on Electrical Characteristics of Gate Oxides
- Fabrication and Characterization of the Pd-Silicided Emitters for Field-Emission Devices
- Characterization and Fabrication of Chimney-Shaped Metal Field Emitters
- Fabrication and Characterization of Diamond-Clad Silicon Field Emitter Arrays
- Simulation of the Electrical Characteristics of Field Emission Triodes with Various Gate Structures
- A New Fabrication Technology for Field-Emission Triodes with Emitter-Gate Separation of 0.18 μm
- Excellent Emission Characteristics of Tunneling Oxides Formed Using Ultrathin Silicon Films for Flash Memory Devices
- Electrical Characteristics of Thirn-Film Transistors with Double-Active-Layer Structure
- A New Portrayal of Oxidation of Undoped Polycrystalline Silicon Films in a Short Duration
- Mechanism and Modeling of Ring Pattern Formation for Electron Beam Exposure on Zwitterresist
- Investigation of A 450V Rating Silicon-On-Insulator Lateral-Double-Diffused-Metal-Oxide-Semiconductor Fabrication by 12/25/5/40V Bipolar-Complementary Metal-Oxide-Semiconductor Double-Diffused Metal-Oxide-Semiconductor Process on Bulk Silicon Substrate
- Lateral Superjunction Reduced Surface Field Structure for the Optimization of Breakdown and Conduction Characteristics in a High-Voltage Lateral Double Diffused Metal Oxide Field Effect Transistor
- Electrical Detection of Protein Using Gold Nanoparticles and Nanogap Electrodes
- Room Temperature Operation of a Coulomb Blockade Sensor Fabricated by Self-Assembled Gold Nanoparticles using Deoxyribonucleic Acid Hybridization
- Excellent Au/Ge/Pd Ohmic Contacts to n-type GaAs Using Mo/Ti as the Diffusion Barrier
- High-Performance Au/Ti/Ge/Pd Ohmic Contacts on n-Type In_Ga_P
- Generalized Interconnect Delay Time and Crosstalk Models: II. Crosstalk-Induced Delay Time Deterioration and Worst Crosstalk Models : Semiconductors
- Generalized Interconnect Delay Time and Crosstalk Models: I. Applications of Interconnect Optimization Design : Semiconductors
- Thin-Film Transistors with Polycrystalline Silicon Films Prepared by Two-Step Rapid Thermal Annealing
- Preparation of Silver Nanorods by Rapid Microwave Heating
- Enhanced Extreme Ultraviolet Lithography Mask Inspection Contrast Using Fabry-Perot Type Antireflective Coating
- Diluted Low Dielectric Constant Materials as Bottom Antireflective Coating Layers for both KrF and ArF Lithography Processes
- Thermal Flow and Chemical Shrink Techniques for Sub-100 nm Contact Hole Fabrication in Electron Beam Lithography
- Reduction Substrate Alkaline Contamination by Utilizing Multi-Layer Bottom Antireflective Coating Structures in ArF Lithography
- Low Dielectric Constant Polymer Materials as Bottom Antirefiective Coating Layers for both KrF and ArF Lithography
- Separation and Study of the Optical Properties of Silver Nanocubes by Capillary Electrophoresis
- Characterizing Optical Properties of Self-Assembled Gold Nanoparticles for Surface Plasmon Resonance Device Applications
- Fabrication of Silicon and Germanium Nanostructures by Combination of Hydrogen Plasma Dry Etching and VLS Mechanism
- Effect of Temperature and Illumination on the Instability of a-Si:H Thin-Film Transistors under AC Gate Bias Stress : Semiconductors
- Turnaround Phenomenon of Threshold Voltage Shifts in Amorphous Silicon Thin Film Transistors under Negative Bias Stress
- The Instability Mechanisms of Hydrogenated Amorphous Silicon Thin Film Transistors under AC Bias Stress
- The Instability Characteristics of Amorphous Silicon Thin Film Transistors with Various Interfacial and Bulk Defect States
- Plasma Passivation Effects on Polycrystalline Silicon Thin-Film Transistors Utilizing Nitrous Oxide Plasma
- Growth and field emission characteristics of carbon nanotubes using Co/Cr/Al multilayer catalyst
- Characterizing Optical Properties of Self-Assembled Gold Nanoparticles for Surface Plasmon Resonance Device Applications
- Porous Materials with Ultralow Optical Constants for Integrated Optical Device Applications
- Characterizing Optical Properties of Self-Assembled Gold Nanoparticles for Surface Plasmon Resonance Device Applications
- Multilayer Bottom Antireflective Coatings for High Numerical Aperture and Modified Illumination Exposure Systems
- Enhanced Extreme Ultraviolet Lithography Mask Inspection Contrast Using Fabry-Perot Type Antireflective Coating
- Room Temperature Operation of a Coulomb Blockade Sensor Fabricated by Self-Assembled Gold Nanoparticles using Deoxyribonucleic Acid Hybridization
- Mechanism and Modeling of Ring Pattern Formation for Electron Beam Exposure on Zwitterresist
- Microwave Heating for the Preparation of Nanometer Gold Particles
- Porous Materials with Ultralow Optical Constants for Integrated Optical Device Applications
- Synthesis of Nanometer-Sized Poly (methyl methacrylate) Polymer Network by Gold Nanoparticle Template