Mechanism and Modeling of Ring Pattern Formation for Electron Beam Exposure on Zwitterresist
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概要
- 論文の詳細を見る
The novel sensitivity curve was determined for the zwitterresist. The irradiation dose in the center could create a ring pattern due to simultaneous exhibition of the positive tone and negative tone of zwitterresist. The natural logarithm dependence of ring width and electron beam dose was linear in two ranges, irrespective of the dot design radius. The heating effect was identified from 600 μC/cm2, while it could be neglected at less than 600 μC/cm2. Mathematical modeling for the prediction of ring width for zwitterresist was achieved by considering the electron scattering and heating effects. The results of experimental measurement and modeling on ring width showed a very good correlation.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2003-06-15
著者
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Chen Jem-kun
National Nano Device Laboratories
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KO Fu-Hsiang
National Nano Device Lab.
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Chang Feng-chih
Department Of Electrical Engineering National Cheng Kung University
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Chen Hsuen-li
National Nano Device Lab.
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Chen Hsuen-Li
National Nano Device Laboratories, 1001-1, Ta-Hsueh Rd, Hsinchu 30050, Taiwan
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Ko Fu-Hsiang
National Nano Device Laboratories, 1001-1, Ta-Hsueh Rd, Hsinchu 30050, Taiwan
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Chen Jem-Kun
National Nano Device Laboratories, 1001-1, Ta-Hsueh Rd, Hsinchu 30050, Taiwan
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Chang Feng-Chih
Department of Applied Chemistry, National Chiao Tung University, Hsinchu, Taiwan
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