Enhanced Extreme Ultraviolet Lithography Mask Inspection Contrast Using Fabry-Perot Type Antireflective Coating

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2004-06-30

著者

• Chen Hsuen-li

  Department Of Materials Science And Engineering National Taiwan University

• Chen H‐c

  Department Of Electronics Engineering And Institute Of Electronics National Chiao Tung University

• Cheng H‐c

  National Tsing Hua Univ. Hsinchu Twn

• KO Fu-Hsiang

  National Nano Device Lab.

• Chu Tien-chi

  Yuanpei Institute Of Science And Technology

• Ko F‐h

  National Nano Device Lab.

• Lai Lee-jene

  National Synchrotron Radiation Research Center

• CHENG Hsu-Chun

  National Nano Device Lab.

• KO Tsung-Shine

  National Tsing Hua University

• CHU Tieh-Chi

  National Tsing Hua University

• Ko Tsung-shine

  National Nano Device Laboratry

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