Elimination of Dielectric Degradation for Chemical-Mechanical Planarization of LOW-k Hydrogen Silisesquioxane
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2001-05-01
著者
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Tsai Tsung-ming
Institute Of Electronics National Chiao Tung University
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CHANG Ting-Chang
Department of Physics, National Sun Yat-Sen University
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SZE Simon-M.
National Nano Device Laboratories
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Sze Simon
Department Of Electronics Engineering And Institute Of Electronics National Chiao-tung University:na
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LIU Po-Tsun
National Nano Device Laboratory
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YEH Fon-Shan
Institute of Electrical Engineering, National Tsing Hua University
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TSENG Tseung-Yuen
Institute of Electronics, National Chiao Tung University
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TSAI Ming-Shih
National Nano Device Laboratory
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CHEN Ben-Chang
National Nano Device Laboratory
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YANG Ya-Liang
National Nano Device Laboratory
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Chang T‐c
Department Of Physics National Sun Yat-sen University
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Chang Ting-chang
Department Of Physics National Sun Yat-sen University
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