TSENG Tseung-Yuen | Institute of Electronics, National Chiao Tung University
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概要
関連著者
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TSENG Tseung-Yuen
Institute of Electronics, National Chiao Tung University
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Tseng Tseung-yuen
Institute Of Electronics National Chiao Tung University
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Huang T‐y
National Chiao Tung Univ. Hsinchu Twn
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Tsai Tsung-ming
Institute Of Electronics National Chiao Tung University
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CHANG Ting-Chang
Department of Physics, National Sun Yat-Sen University
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LEU Ching-Chich
National Nano Device Laboratory
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HUANG Tiao-Yuan
National Nano Device Laboratory
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Yang M‐j
Kyushu Univ. Fukuoka Jpn
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Huang Tiao-yuan
National Nano Device Laboratories
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CHIEN Chao-Hsin
National Nano Device Laboratories
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SZE Simon-M.
National Nano Device Laboratories
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Sze Simon
Department Of Electronics Engineering And Institute Of Electronics National Chiao-tung University:na
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YANG Ming-Jui
National Nano Device Laboratory
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LIU Po-Tsun
National Nano Device Laboratory
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YEH Fon-Shan
Institute of Electrical Engineering, National Tsing Hua University
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TSAI Ming-Shih
National Nano Device Laboratory
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CHEN Ben-Chang
National Nano Device Laboratory
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YANG Ya-Liang
National Nano Device Laboratory
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Chang T‐c
Department Of Physics National Sun Yat-sen University
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Yang Ming-jui
National Nano Device Laboratories
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ZHANG Ren-Jian
Institute of Electronics, National Chiao Tung University
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WU Shich-Chuan
National Nano Device Laboratories
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Zhang Ren-jian
Institute Of Electronics National Chiao Tung University
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Chang Ting-chang
Department Of Physics National Sun Yat-sen University
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Huang Tiao-yuan
National Chiao Tung University
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Chen J‐r
Department Of Materials Science And Engineering National Tsing Hua University
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Chen Jiann-ruey
Department Of Materials Science And Engineering National Tsing Hua University
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Leu Ching-chich
National Nano Device Laboratories
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HEN Tian-Shyng
Department of Materials Science and Engineering, National Tsing Hua University
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Hen Tian-shyng
Department Of Materials Science And Engineering National Tsing Hua University
著作論文
- Elimination of Dielectric Degradation for Chemical-Mechanical Planarization of LOW-k Hydrogen Silisesquioxane
- The Effects of Low-Pressure Rapid Thermal Post-Annealing on the Properties of (Ba, Sr)TiO_3 Thin Films Deposited by Liquid Source Misted Chemical Deposition : Instrumentation, Measurement, and Fabrication Technology
- Preparation of Bi_Pb_Sr_Ca_Cu_O_y High-T_c Superconductor by the Citrate Method