YANG Ming-Jui | National Nano Device Laboratory

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概要

• Yang Ming-Juiの詳細を見る
• 同名の論文著者
• National Nano Device Laboratoryの論文著者

関連著者

• Yang M‐j

  Kyushu Univ. Fukuoka Jpn

• CHIEN Chao-Hsin

  National Nano Device Laboratories

• YANG Ming-Jui

  National Nano Device Laboratory

• Yang Ming-jui

  National Nano Device Laboratories

• Huang T‐y

  National Chiao Tung Univ. Hsinchu Twn

• Lehnen Peer

  Aixtron Ag Kackertstr

• Chang Chun-yen

  Institute Of Electronics National Chiao Tung University

• HUANG Tiao-Yuan

  Institute of Electronics, National Chiao Tung University

• LEU Ching-Chich

  National Nano Device Laboratory

• HUANG Tiao-Yuan

  National Nano Device Laboratory

• Huang Tiao-yuan

  National Nano Device Laboratories

• Tsui Bing-yue

  Institute Of Electronics National Chiao-tung University

• LU Wen-Tai

  Institute of Electronics, National Chiao-Tung University

• LAN Wen-Ting

  Institute of Electronics, National Chiao-Tung University

• LEE Tsung-Chieh

  Institute of Electronics, National Chiao-Tung University

• SHEN Shih-Wen

  National Nano Device Laboratory

• CHEN Ching-Wei

  Institute of Electronics, National Chiao-Tung University

• PERNG Tsu-Hsiu

  Institute of Electronics, National Chiao-Tung University

• LIANG Jann-Shyang

  Institute of Electronics, National Chiao-Tung University

• TSENG Tseung-Yuen

  Institute of Electronics, National Chiao Tung University

• Perng Tsu-hsiu

  Institute Of Electronics National Chiao-tung University

• ZHANG Ren-Jian

  Institute of Electronics, National Chiao Tung University

• WU Shich-Chuan

  National Nano Device Laboratories

• Zhang Ren-jian

  Institute Of Electronics National Chiao Tung University

• Huang Tiao-yuan

  National Chiao Tung University

• Leu Ching-chich

  National Nano Device Laboratories

• Tseng Tseung-yuen

  Institute Of Electronics National Chiao Tung University

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著作論文

• Improvements on Electrical Characteristics of p-Channel Metal-Oxide-Semiconductor Field Effect Transistors with HfO_2 Gate Stacks by Post Deposition N_2O Plasma Treatment
• Electrical Characteristics of Thin HfO_2 Gate Dielectrics Prepared Using Different Pre-Deposition Surface Treatments
• The Effects of Low-Pressure Rapid Thermal Post-Annealing on the Properties of (Ba, Sr)TiO_3 Thin Films Deposited by Liquid Source Misted Chemical Deposition : Instrumentation, Measurement, and Fabrication Technology

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