The Effects of Low-Pressure Rapid Thermal Post-Annealing on the Properties of (Ba, Sr)TiO_3 Thin Films Deposited by Liquid Source Misted Chemical Deposition : Instrumentation, Measurement, and Fabrication Technology

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 2001-12-01

著者

• Huang T‐y

  National Chiao Tung Univ. Hsinchu Twn

• LEU Ching-Chich

  National Nano Device Laboratory

• HUANG Tiao-Yuan

  National Nano Device Laboratory

• Yang M‐j

  Kyushu Univ. Fukuoka Jpn

• Huang Tiao-yuan

  National Nano Device Laboratories

• CHIEN Chao-Hsin

  National Nano Device Laboratories

• YANG Ming-Jui

  National Nano Device Laboratory

• TSENG Tseung-Yuen

  Institute of Electronics, National Chiao Tung University

• Yang Ming-jui

  National Nano Device Laboratories

• ZHANG Ren-Jian

  Institute of Electronics, National Chiao Tung University

• WU Shich-Chuan

  National Nano Device Laboratories

• Zhang Ren-jian

  Institute Of Electronics National Chiao Tung University

• Huang Tiao-yuan

  National Chiao Tung University

• Leu Ching-chich

  National Nano Device Laboratories

• Tseng Tseung-yuen

  Institute Of Electronics National Chiao Tung University

関連論文

• A New Method to Extract MOSFET Threshold Voltage, Effective Channel Length, and Channel Mobility Using S-parameter Measurement(Active Devices and Circuits)(Advances in Characterization and Measurement Technologies for Microwave and Millim
• Ion-Implantation Treatment(Ba, Sr)TiO_3 Thin Films
• Thermal Stability of Co-Sputtered Ru-Ti Alloy Electrodes for Dynamic Random Access Memory Applications
• Rapid-Thermal-Processed BaTiO_3 Thin Films Deposited by Liquid-Source Misted Chemical Deposition
• Characteristics of Poly-Si Nanowire Thin Film Transistors with Double-Gated Structures
• Hot Carrier Degradations of Dynamic Threshold Silicon on Insulator p-Type Metal-Oxide-Semiconductor Field Effect Transistors
• Impacts of LP-SiN Capping Layer and Lateral Diffusion of interface Trap on Hot Carrier Stress of NMOSFETs
• A novel method to convert metallic-type CNTs to semiconducting-type CNT-FETs
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• Application of Field-Induced Source/Drain Schottky Metal-Oxide-Semiconductor to Fin-Like Body Field-Effect Transistor : semiconductors
• Impact of Thermal Stability on the Characteristics of Complementary Metal Oxide Semiconductor Transistors with TiN Metal Gate
• Plasma-Process-Induced Damage in Sputtered TiN Metal-Gate Capacitors with Ultrathin Nitrided Oxides
• The Combined Effects of Nitrogen Implantation at S/D Extension and N_2O Oxide on 0.18μm N- and P-Metal Oxide Field Effect Transistors (MOSEETs)
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• The Effects of Low-Pressure Rapid Thermal Post-Annealing on the Properties of (Ba, Sr)TiO_3 Thin Films Deposited by Liquid Source Misted Chemical Deposition : Instrumentation, Measurement, and Fabrication Technology
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• Reduction of Off-State Leakage Current in Schottky Barrier Thin-Film Transistors (SBTFT) by a Field-Induced Drain
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• Rapid-Thermal-Processed BaTiO3 Thin Films Deposited by Liquid-Source Misted Chemical Deposition
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