Tsui Bing-yue | Institute Of Electronics National Chiao-tung University

スポンサーリンク

概要

• 同名の論文著者
• Institute Of Electronics National Chiao-tung Universityの論文著者

関連著者

• CHIEN Chao-Hsin

  National Nano Device Laboratories

• Tsui Bing-yue

  Institute Of Electronics National Chiao-tung University

• Lehnen Peer

  Aixtron Ag Kackertstr

• LIANG Jann-Shyang

  Institute of Electronics, National Chiao-Tung University

• Yang Ming-jui

  National Nano Device Laboratories

• Perng Tsu-hsiu

  Institute Of Electronics National Chiao-tung University

• Chang Chun-yen

  Institute Of Electronics National Chiao Tung University

• Yang M‐j

  Kyushu Univ. Fukuoka Jpn

• YANG Ming-Jui

  National Nano Device Laboratory

• CHEN Ching-Wei

  Institute of Electronics, National Chiao-Tung University

• PERNG Tsu-Hsiu

  Institute of Electronics, National Chiao-Tung University

• Chang Chun-yen

  Institute Of Electronics National Chiao Tang University:national Nano-device Laboratories

• Chen Ching-wei

  Institute Of Electronics National Chiao-tung University

• Chang Chun-Yen

  Institute of Electronics, National Chiao-Tung University, Hsinchu 300, Taiwan

• Tsui Bing-Yue

  Institute of Electronics, National Chiao-Tung University, Hsinchu 300, Taiwan

• Liang Jann-Shyang

  Institute of Electronics, National Chiao-Tung University, Hsinchu 300, Taiwan

• Chen Ching-Wei

  Institute of Electronics, National Chiao-Tung University, Hsinchu 300, Taiwan

• Yang Ming-Jui

  National Nano Device Laboratory, Hsinchu 300, Taiwan

• Chien Chao-Hsin

  National Nano Device Laboratory, Hsinchu 300, Taiwan

• Lehnen Peer

  Aixtron AG, Kackertstr, 15-17 Aachen 52072, Germany

• Perng Tsu-Hsiu

  Institute of Electronics, National Chiao-Tung University, Hsinchu 300, Taiwan

もっと見る 閉じる

著作論文

• Electrical Characteristics of Thin HfO_2 Gate Dielectrics Prepared Using Different Pre-Deposition Surface Treatments
• Electrical Characteristics of Thin HfO2 Gate Dielectrics Prepared Using Different Pre-Deposition Surface Treatments

スポンサーリンク