Enhancing the Oxygen Plasma Resistance of Low-k Methylsilsesquioxane by H_2 Plasma Treatment
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1999-06-15
著者
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Sze S‐m
National Nano Device Lab. Hsinchu Twn
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CHANG Ting-Chang
Department of Physics, National Sun Yat-Sen University
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SZE Simon
National Nano Device Laboratory
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LIU Po-Tsun
Department of Photonics and Display Institute, National Chiao Tung University
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Sze S
National Chiao‐tung Univ. Hsinchu Twn
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Sze Simon
Department Of Electronics Engineering And Institute Of Electronics National Chiao-tung University:na
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Sze Simon-m.
National Nano Device Laboratory
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CHANG Ting-Chang
National Nano Device Laboratories
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LIU Po-Tsun
National Nano Device Laboratory
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MOR Yi-Shian
Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University
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Chang T‐c
Department Of Physics National Sun Yat-sen University
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Liu Po-tsun
Department Of Photonics And Display Institute National Chiao Tung University
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Chang Ting-chang
Department Of Physics National Sun Yat-sen University
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Mor Y‐s
National Chiao Tung Univ. Hsin‐chu Twn
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Liu P‐t
National Nano Device Lab. Hsin‐chu Twn
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Liu Po-Tsun
Department of Electronics Engineering and Institute of Electronics, National Chiao-Tung University
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