Enhancement of Barrier Properties in Chemical Vapor Deposited TiN Employing Multi-Stacked Ti/TiN Structure
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2000-02-01
著者
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Sze S‐m
National Nano Device Lab. Hsinchu Twn
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CHANG Ting-Chang
Department of Physics, National Sun Yat-Sen University
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SZE Simon
National Nano Device Laboratory
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LIU Po-Tsun
Department of Photonics and Display Institute, National Chiao Tung University
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Sze S
National Chiao‐tung Univ. Hsinchu Twn
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Sze Simon
Department Of Electronics Engineering And Institute Of Electronics National Chiao-tung University:na
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Sze Simon-m.
National Nano Device Laboratory
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LIU Po-Tsun
National Nano Device Laboratory
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YANG Ya-Liang
National Nano Device Laboratory
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HU Jung-Chih
Department of Materials Science and Engineering, National Tsing-Hua University
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Chang T‐c
Department Of Physics National Sun Yat-sen University
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Liu Po-tsun
Department Of Photonics And Display Institute National Chiao Tung University
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Hu Jung-chih
Department Of Materials Science And Engineering National Tsing-hua University
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Chang Ting-chang
Department Of Physics National Sun Yat-sen University
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Chang Ting-chang
Department Of Electronics Engineering National Chiao Tung University And National Nano Device Labora
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Liu P‐t
National Nano Device Lab. Hsin‐chu Twn
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Liu Po-Tsun
Department of Electronics Engineering and Institute of Electronics, National Chiao-Tung University
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