Investigation of a High Quality and Ultraviolet-Light Transparent Plasma-Enhanced Chemical Vapor Deposition Silicon Nitride Film for Non-Volatile Memory Application

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1995-09-15

著者

• Wang C‐k

  Department Of Electrical Engineering National Cheng-kung University

• Wang Chin-kun

  Department Of Electronics Engineering And Institute Of Electronics National Chiao Tang University

• Liu L‐m

  Taiwan Semiconductor Manufacturing Co. Ltd. Hsinchu Twn

• Liu Lu-min

  Taiwan Semiconductor Manufacturing Company Ltd.

• LIN Mou-Shiung

  Taiwan Semiconductor Manufacture Company

• Ying Tser-liang

  Taiwan Semiconductor Manufacturing Company Ltd.

• WEI Chih-Shih

  Taiwan Semiconductor Manufacturing Company Ltd.

• Cheng Huang-chung

  Department Of Electronics Engineering And Institute Of Electronics National Chiao Tang University

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