Leakage Current Reduction of Chemical-Vapor-Deposited Ta_2O_5 Films on Rugged Polycrystalline Silicon Electrode for Dynamic Random Access Memory Application

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1999-04-15

著者

• Chang Chun-yen

  Institute Of Electronics National Chiao Tung University

• HUANG Tiao-Yuan

  Institute of Electronics, National Chiao Tung University

• Huang Tiao-yuan

  Institute Of Electronics National Chiao Tung University

• Chang Chun-yen

  Institute Of Electronics National Chiao Tang University:national Nano-device Laboratories

• LIN Mark

  Institute of Electronics, National Chiao Tung University

• SHIEH Win-Yi

  United Micro-electron Corp., Science Base Industrial Park

• Lin Mark

  Institute Of Electronics National Chiao Tung University

• Shieh Win-yi

  United Micro-electron Corp. Science Base Industrial Park

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