Effects of N_2O-Plasma Treatment of a-SiO_xN_y/a-SiN_x Gate Insulators on Electrical Stability of a-Si:H Thin-Film Transistors

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1994-07-15

著者

• Hong Jyh-wong

  Department Of Electrical Engineering National Central University

• Chang Chun-yen

  Institute Of Electronics National Chiao Tung University

• JEN Tean-Sen

  Department of Electrical Engineering, National Central University

• Jen Tean-sen

  Department Of Electrical Engineering National Central University

• Chang Chun-yen

  Institute Of Electronics National Chiao Tang University:national Nano-device Laboratories

• LEU Shyue-Ter

  Department of Electrical Engineering, National Central University

• CHOU Tsung-Chih

  Department of Electrical Engineering, National Central University

• Leu Shyue-ter

  Department Of Electrical Engineering National Central University

• CHANG Chun-Yen

  Institute of Electronics, National Chiao Tung University

• HONG Jyh-Wong

  Department of Electrical Engineering, National Central University

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