A Low Thermal Budget High Performance 0.25-0.18 μm Merged Logic Device and Dynamic Random Access Memory Application
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概要
- 論文の詳細を見る
Merged dynamic random access memory(DRAM)with logic technology has been widely investigated because of to its high on-chip memory bandwidth, low power consumption, customized memory size, and small footprint advantages. A low thermal budget 0.25-0.18 μm embedded DRAM technology has been developed to merge a high-performance logic device and high-density DRAM on the same chip. In this newly developed technology, shallow trench isolation, a triple well, TiSi_x polycide, titanium salicide, a self-aligned contact poly-via and a low thermal budget oxide-nitride-oxide(ONO)as well as Ta_2O_5 capacitor dielectircs used for 1 Gbit DRAM design, are being applied. A 32 Mbit synchronous DRAM macro was designed based on this technology and is proposed offered as a drop-in module for embedded DRAM applications.
- 社団法人応用物理学会の論文
- 2000-04-30
著者
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Jung Le-tien
United Microelectronics Corporation (umc) Central R&d Division
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Jung Le-tien
United Microelectronics Corp. Specialty Technology Department Technogoly & Process Development D
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Yeh Wen-kuan
United Microelectronics Corp. Specialty Technology Department Technogoly & Process Development D
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Chang Sun-jay
United Microelectronics Corp. Specialty Technology Department Technogoly & Process Development D
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Lin Yung-chang
United Microelectronics Corp. Specialty Technology Department Technogoly & Process Development D
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SUN Shin-Wei
United Microelectronics Crop., Technology Development Division, Science-Based Industrial Park
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Sun Shin-wei
United Microelectronics Corp. Specialty Technology Department Technogoly & Process Development D
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CHEN Tung-Po
United Microelectronics Corp., Specialty Technology Department, Technogoly & Process Development Div
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HUANG Cheng-Tung
United Microelectronics Corp., Specialty Technology Department, Technogoly & Process Development Div
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LIN Wen-Jeng
United Microelectronics Corp., Specialty Technology Department, Technogoly & Process Development Div
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CHIEN Sun-Chieh
United Microelectronics Corp., Specialty Technology Department, Technogoly & Process Development Div
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LIOU Fou-Tai
United Microelectronics Corp., Specialty Technology Department, Technogoly & Process Development Div
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Lin Wen-jeng
United Microelectronics Corp. Specialty Technology Department Technogoly & Process Development D
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Liou F‐t
United Microelectronics Corp. Hsin‐chu City Twn
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Chen Tung-po
United Microelectronics Corp. Specialty Technology Department Technogoly & Process Development D
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Huang Cheng-tung
United Microelectronics Corp. Specialty Technology Department Technogoly & Process Development D
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Chien Sun-chieh
United Microelectronics Corp. Specialty Technology Department Technogoly & Process Development D
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Huang Cheng-Tung
United Microelectronics Corp. (UMC), CRD Logic Division, No. 18, Nanke 2nd Rd., Tainan Science Park, Sinshih Township, Tainan County 741, Taiwan 12457, R.O.C.
関連論文
- The Effects of Super-Steep-Retrograde Indium Channel Profile on Deep Submicron n-Channel Metal-Oxide-Semiconductor Field-Effect Transistor
- A Novel Shallow Trench Isolation with Mint-Spacer Technology
- Impact of Reducing Shallow Trench Isolation Mechanical Stress on Active Length for 40 nm n-Type Metal--Oxide--Semiconductor Field-Effect Transistors
- A Low Thermal Budget High Performance 0.25-0.18 μm Merged Logic Device and Dynamic Random Access Memory Application
- The Effects of Super-Steep-Retrograde Indium Channel Profile on Deep Submicron n-Channel Metal-Oxide-Semiconductor Field-Effect Transistor
- New Negative-Bias-Temperature-Instability Improvement Using Buffer Layer under Highly Compressive Contact Etch Stop Layer for 45-nm-Node Complementary Metal–Oxide–Semiconductor and Beyond
- Optimization of Active Geometry Configuration and Shallow Trench Isolation (STI) Stress for Advanced CMOS Devices