Effect of Mixed-Mode Electrical Stress on High-Frequency and RF Power Characteristics of SiGe Hetero-Junction Bipolar Transistors
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概要
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In this study, we investigate the hot-carrier stress effects on the high-frequency and RF power characteristics of Si/SiGe hetero-junction bipolar transistors (HBTs). By simultaneously applying a high collector current density and a high collector–base voltage on Si/SiGe HBTs, because hot carriers will be induced; they will then degrade device performance. This is interesting because this stress condition is similar to the DC bias condition of a current source RF power amplifier, termed as the "mixed-mode" stress. We find that not only the high-frequency characteristic is adversely affected by but also the output power performance of Si/SiGe HBTs suffers from this electrical stress. In addition, we found that the degradations of the high-frequency and power characteristics of such HBTs are worse in constant-base-current measurement than in constant-collector-current measurement. We finally examined the degradations in terms of parasitic resistance and the ideality factors of base and collector currents using a large-signal model.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2008-04-25
著者
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Huang Guo-wei
National Nano Device Laboratories
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CHEN Kun-Ming
National Nano Device Laboratories
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HUNG Cheng-Chou
United Microelectronics Corporation (UMC)
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Huang Sheng-yi
United Microelectronic Corporation (umc)
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Liao Wen-shiang
United Microelectronic Corporation (umc)
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Lien Chen-Hsin
Department of Electrical Engineering, National Tsing Hua University, Hsinchu 300, Taiwan
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Liao Wen-Shiang
United Microelectronics Corporation (UMC), No. 3, Li-Hsin Rd. II, Hsinchu 300, Taiwan
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Hung Cheng-Chou
United Microelectronics Corporation (UMC), No. 3, Li-Hsin Rd. II, Hsinchu 300, Taiwan
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Huang Sheng-Yi
United Microelectronics Corporation (UMC), No. 3, Li-Hsin Rd. II, Hsinchu 300, Taiwan
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