Atomic-Layer Doping in Si_<1-x>Ge_x/Si/Si_<1-x>Ge_x Heterostructures by Two-Step Solid-Phase Epitaxy
スポンサーリンク
概要
- 論文の詳細を見る
- 1998-09-07
著者
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山口 滋
Department Of Physics School Of Science Tokai University
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NAKAGAWA Kiyokazu
Center for Crystal Science and Technology, University of Yamanashi
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Yamaguchi S
Hitachi Ltd. Tokyo Jpn
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SUGII Nobuyuki
Central Research Laboratory, Hitachi, Ltd.
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NAKAGAWA Kiyokazu
Central Research Laboratory, Hitachi Ltd.
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YAMAGUCHI Shinya
Central Research Laboratory, Hitachi Ltd.
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Yamaguchi Shinji
Department Of Electrical Engineering Suzuka Technical College
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Yamaguchi Shigeo
High-tech Research Center Meiji University
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Yamaguchi Shigeo
Department Of Physics Tokyo Metropolitan University
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Yamaguchi Shigeo
Department Of Electronic Science And Engineering Kyoto University
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Nakagawa Kenichi
Liquid Ctystal Laboratories Sharp Corporation
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Nakagawa K
Department Of Advanced Material Science Faculty Of Engineering Kagawa University
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Sugii N
Central Research Laboratory Hitachi Ltd.
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Sugii Nobuyuki
Central Research Laboratory Hitachi Ltd.
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Miyao M
Central Research Laborotory Hitachi Ltd.:(present Address)information Science And Electrical Enginee
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Miyao Masanobu
Central Research Laboratory
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Nakagawa K
Center For Crystal Science And Technology University Of Yamanashi
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Nakagawa Kiyokazu
Central Research Laboratory Hitachi Ltd.
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Nakagawa Keisuke
Department Of Applied Physics Faculty Of Science Science University Of Tokyo
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Yamaguchi Shinya
Central Research Laboratory Hitachi Ltd.
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