Effect of Atomic and Molecular Hydrogen Irradiation on Ge Surface Segregation during Si Molecular Beam Epitaxy

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1994-09-15

著者

• Shimada Toshikazu

  Electronics Research Laboratory Nissan Motor Co. Ltd.

• NAKAGAWA Kiyokazu

  Center for Crystal Science and Technology, University of Yamanashi

• Kimura Yoshinobu

  Central Research Laboratory Hitachi Ltd.

• Nishida Akio

  Central Research Laboratory Hitachi Ltd.

• SHIMADA Toshikazu

  Central Research Laboratory, Hitachi Ltd.

• NAKAGAWA Kiyokazu

  Central Research Laboratory, Hitachi Ltd.

• Nakagawa Kenichi

  Liquid Ctystal Laboratories Sharp Corporation

• Nakagawa K

  Department Of Advanced Material Science Faculty Of Engineering Kagawa University

• Nishida A

  Hitachi Ltd. Tokyo Jpn

• Shimada T

  Presto Japan Science And Technology Corporation (jst) And Department Of Chemistry The University Of

• Nakagawa K

  Center For Crystal Science And Technology University Of Yamanashi

• Shimada Toshikazu

  Central Research Laboratory

• Nakagawa Kiyokazu

  Central Research Laboratory Hitachi Ltd.

• Nakagawa Keisuke

  Department Of Applied Physics Faculty Of Science Science University Of Tokyo

• KIMURA Yoshinobu

  Central Research Laboratory, Hitachi, Ltd.

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