Chemical Vapor Deposition of a-SiGe:H Films Utilizing a Microwave-Excited Plasma

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1987-04-20

著者

• Shimada Toshikazu

  Electronics Research Laboratory Nissan Motor Co. Ltd.

• Tanaka M

  Production Engineering Research Laboratory Hitachi Ltd.

• Watanabe Teruo

  Futaba Corporation

• Watanabe T

  Components Development Group Sony Corporation

• Watanabe T

  Ritsumeikan Univ. Shiga Jpn

• Watanabe T

  Tokyo Univ. Agriculture And Technol. Tokyo Jpn

• Watanabe Toshihide

  Atr Adaptive Communications Research Laboratories:(present Address)science And Technical Research La

• SHIMADA Toshikazu

  Central Research Laboratory, Hitachi Ltd.

• Tanaka M

  Toshiba Corp. Kawasaki Jpn

• Tanaka M

  Institute Of Multidisciplinary Research For Advanced Materials Tohoku University

• Azuma K

  Department Of Electric Engineering Himeji Institute Of Technology

• WATANABE Takeshi

  Production Engineering Research Laboratory, Hitachi, Ltd.

• AZUMA Kazufumi

  Production Engineering Research Laboratory, Hitachi, Ltd.

• NAKATANI Mitsuo

  Production Engineering Research Laboratory, Hitachi, Ltd.

• TANAKA Masahiro

  Production Engineering Research Laboratory, Hitachi, Ltd.,

• SONOBE Tadashi

  Hitachi Works, Hitachi, Ltd.,

• Sonobe T

  Hitachi Works Hitachi Ltd.

• Sonobe Tadashi

  Hitachi Ltd. Hitachi Works.

• Shimada T

  Presto Japan Science And Technology Corporation (jst) And Department Of Chemistry The University Of

• Shimada Toshikazu

  Central Research Laboratory

• Nakatani Mitsuo

  Production Engineering Research Laboratory Hitachi Ltd.

• Azuma Kazufumi

  Production Engineering Research Laboratory, Hitachi Ltd. (Present address)Data Strage and Retrieval Systems Division, Hitachi, Ltd.

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