Azuma Kazufumi | Production Engineering Research Laboratory, Hitachi Ltd. (Present address)Data Strage and Retrieval Systems Division, Hitachi, Ltd.

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概要

• 同名の論文著者
• Production Engineering Research Laboratory, Hitachi Ltd. (Present address)Data Strage and Retrieval Systems Division, Hitachi, Ltd.の論文著者

関連著者

• Azuma Kazufumi

  Production Engineering Research Laboratory, Hitachi Ltd. (Present address)Data Strage and Retrieval Systems Division, Hitachi, Ltd.

• Azuma K

  Department Of Electric Engineering Himeji Institute Of Technology

• AZUMA Kazufumi

  Production Engineering Research Laboratory, Hitachi, Ltd.

• Shimada Toshikazu

  Electronics Research Laboratory Nissan Motor Co. Ltd.

• Watanabe Teruo

  Futaba Corporation

• Watanabe T

  Components Development Group Sony Corporation

• Watanabe T

  Ritsumeikan Univ. Shiga Jpn

• Watanabe T

  Tokyo Univ. Agriculture And Technol. Tokyo Jpn

• Watanabe Toshihide

  Atr Adaptive Communications Research Laboratories:(present Address)science And Technical Research La

• SHIMADA Toshikazu

  Central Research Laboratory, Hitachi Ltd.

• WATANABE Takeshi

  Production Engineering Research Laboratory, Hitachi, Ltd.

• Shimada T

  Presto Japan Science And Technology Corporation (jst) And Department Of Chemistry The University Of

• Shimada Toshikazu

  Central Research Laboratory

• NAKATANI Mitsuo

  Production Engineering Research Laboratory, Hitachi, Ltd.

• Nakatani Mitsuo

  Production Engineering Research Laboratory Hitachi Ltd.

• Watanabe Tetsu

  Components Development Group Sony Corporation

• SONOBE Tadashi

  Hitachi Works, Hitachi, Ltd.,

• Sonobe T

  Hitachi Works Hitachi Ltd.

• Sonobe Tadashi

  Hitachi Ltd. Hitachi Works.

• Tasaka Kenji

  Production Engineering Research Laboratory Hitachi Ltd.

• Tanaka M

  Production Engineering Research Laboratory Hitachi Ltd.

• Inaba Hiroshi

  Production Engineering Research Laboratory Hitachi Ltd.

• Tanaka M

  Toshiba Corp. Kawasaki Jpn

• Tanaka M

  Institute Of Multidisciplinary Research For Advanced Materials Tohoku University

• TANAKA Masahiro

  Production Engineering Research Laboratory, Hitachi, Ltd.,

• SHIRAI Hajime

  The Faculty of Engineering, Saitama University

• Tasaka K

  Okayama Univ. Okayama Jpn

• Suzuki Kenji

  Institute For Materials Research Laboratory Tohoku University

• Inaba Hiroshi

  Department Of Information Sciences Tokyo Denki University

• Inaba H

  Tokyo Denki Univ. Tokyo Jpn

• Suzuki K

  横浜国大 大学院工学研究院

• 鈴木 和夫

  横浜大

• SUZUKI Kenji

  Institute for Materials Research, Tohoku University

• Suzuki Kenji

  Institute For Material Resezrch Tohoku University

• Kajiyama Hiroshi

  Advanced Research Laboratory Hitachi Ltd.

• Tanaka M

  Manufacturing Development Center Mitsubishi Electric Corporation

• MURAMATSU Shin-ichi

  Central Research Laboratory

• Muramatsu S

  Univ. Tokyo Tokyo Jpn

• KAMIYAMA Tomoaki

  Institute for Materials Research Laboratory, Tohoku University

• SUZUKI Kazuo

  Hitachi Works, Hitachi, Ltd.

• Kuwai T

  Department Of Physics University Of Toyama

• FUJIMAKI Shigehiko

  Production Engineering Research Laboratory, Hitachi Ltd.

• Muramatsu S

  Hitachi Cable Ltd. Ibaraki Jpn

• Kamiyama T

  Tohoku Univ. Sendai Jpn

• Fujimaki Shigehiko

  Production Engineering Research Laboratory Hitachi Ltd.

• Suzuki Kenji

  Institute For Masterials Research Tohoku University

• Shirai Hajime

  The Faculty of Engineering, Saitama University, 255, Shimo-Okubo, Urawa, Saitama 338-8570, Japan

• Azuma Kazufumi

  Production Engineering Research Laboratory, Hitachi, Ltd., 292, Yoshida-cho, Totsuka-ku, Yokohama 244-0817, Japan

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著作論文

• Gap States in a-SiGe:H Examined by the Constant Photocurrent Method
• Medium-Range Order of Amorphous Silicon Germanium Alloys : Small-Angle X-Ray Scattering Study
• Influence of Deposition Conditions on Properties of a-SiGe:H Prepared by Microwave-Excited Plasma CVD : Condensed Matter
• Microwave-Excited Plasma CVD of a-Si:H Films Utilizing a Hydrogen Plasma Stream or by Direct Excitation of Silane
• Chemical Vapor Deposition of a-SiGe:H Films Utilizing a Microwave-Excited Plasma
• Chemical Vapor Deposition of a-Si:H Films Utilizing a Microwave Excited Ar Plasma Stream
• Structural Study of Ultrathin Hydrogenated Amorphous Carbon Films Using Spectroscopic Ellipsometry and Ultraviolet Raman Spectroscopy
• Control of Plasma Parameters for High-Quality Hydrogenated Amorphous Carbon Growth
• Structural Study of Ultrathin Hydrogenated Amorphous Carbon Films Using Spectroscopic Ellipsometry and Ultraviolet Raman Spectroscopy

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