Suzuki Kenji | Institute For Materials Research Laboratory Tohoku University
スポンサーリンク
概要
関連著者
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Suzuki Kenji
Institute For Materials Research Laboratory Tohoku University
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Suzuki K
Department Of Information And Communication Technology Tokai University
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Suzuki K
Assoc. Super‐advanced Electronics Technol. Kanagawa Jpn
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Suzuki K
School Of Science And Engineering Waseda University:kagami Memorial Laboratory For Materials Science
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Suzuki K
Ntt Transmission Systems Laboratories Lightwave Communications Laboratory
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Suzuki K
Ntt Transmission Systems Lab. Ibaraki Jpn
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Suzuki K
Central Research Laboratory Alps Electric Co. Ltd.
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Suzuki Kenshu
Division Of Public Health Department Of Social Medicine Nihon University School Of Medicine
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Suzuki Kenji
Kdd R & D Laboratories
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Nakamura K
Center For Experimental Medicine Institute Of Medical Science University Of Tokyo
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Nakamura Koji
Division Of Social And Environmental Medicine Department Of Community Preventive Medicine Niigata Un
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Suzuki Kenji
Japan Labor And Welfare Association
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TATARA Kozo
Department of Public Health, Osaka University Medical School
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SUZUKI Katsumi
Superconductivity Research Laboratory,ISTEC
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SUZUKI Kunihiro
Fujitsu Laboratories Ltd.
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NAKANISHI Noriyuki
Department of Public Health Osaka University Medical School
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AOYAMA Takahiro
Daihen Co.
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Aoyama T
Hitachi Ltd. Ibaraki Jpn
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AOYAMA Takayuki
Fujitsu Laboratories Lid.
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TASHIRO Hiroko
Fujitsu Laboratories Ltd.
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TADA Yoko
Fujitsu Laboratories Ltd.
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Tada Y
Fujitsu Laboratories Ltd.
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Hayashi K
Mitsubishi Electric Corp. Amagasaki‐shi、 Jpn
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ENOMOTO Youichi
Superconductivity Research Laboratory,ISTEC
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HORIUCHI Kei
Fujitsu Laboratories Ltd.
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澤田 嗣郎
東京大学
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澤田 嗣郎
Univ. Tokyo Tokyo Jpn
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鈴木 和夫
横浜国大
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Suzuki Kazuhiko
Department of Veterinary Pathology, Graduate School of Agricultural and Life Sciences, The Universit
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Tsuda Shinya
R&d Headquarters Sanyo Electric Co. Ltd.
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ARIMOTO Hiroshi
Fujitsu Laboratories Ltd.
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IMAI Kazuaki
Department of Nuclear Engineering, Hokkaido University
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Imai Kazuaki
Department Of Applied Electronics Hokkaido Institute Of Technology
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SAWADA Takayuki
Department of Electrical Engineering, Faculty of Engineering, Hokkaido University
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Hayashi Kunihiko
Superconductivity Research Laboratory-istec
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Hayashi Kunihiko
Superconductivity Research Laboratory International Superconductivity Technology Center
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Imai Keitaro
Ulsi Process Engineering Laboratory Microelectronics Engineering Laboratory Toshiba Corporation
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OHUE Michio
Hitachi Research Laboratory, Hitachi Ltd.
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YAMAGATA Yuji
Department of Applied Electronics, Hokkaido Institute of Technology
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ARIMOTO Hiroshi
Semiconductor Leading Edge Technologies
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Shimada Toshikazu
Electronics Research Laboratory Nissan Motor Co. Ltd.
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Kai H
Faculty Of Engineering Yokohama National University
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SUZUKI Kazuo
Faculty of Engineering, Yokohama National University
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Suzuki Keita
School Of Agriculture Kyushu Tokai University
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Saito K
Department Of Materials Technology Chiba University
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Watanabe Teruo
Futaba Corporation
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Watanabe T
Components Development Group Sony Corporation
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Watanabe T
Ritsumeikan Univ. Shiga Jpn
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山口 浩一
電気通信大学電子工学科
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OHKUBO Satoshi
Fujitsu Laboratories Ltd.
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Kai Hisashi
Faculty Of Engineering Yokohama National University
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Watanabe T
Tokyo Univ. Agriculture And Technol. Tokyo Jpn
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Watanabe Toshihide
Atr Adaptive Communications Research Laboratories:(present Address)science And Technical Research La
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SHIMADA Toshikazu
Central Research Laboratory, Hitachi Ltd.
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HORIKOSHI Yoshiji
NTT Electrical Communications Laboratories
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Horikoshi Yoshiji
Ntt Basic Research Laboratories:(present Address) School Of Science And Engineering Waseda Universit
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Horikoshi Yoshiji
Ntt Electrial Communication Laboratories
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Yamaguchi Katsumi
Department Of Mechanical Engineering Nagoya University
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SAITO Katsuaki
Hitachi Research Laboratory, Hitachi Ltd.
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TSUBONO Isao
Department of Applied Electronics, Hokkaido Institute of Technology
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SUZUKI Kenji
Institute for Materials Research, Tohoku University
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KATAOKA Yuji
Fujitsu Laboratories Ltd.
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Suzuki Kazuhiro
Department of Earth and Environmental Sciences, Nagoya University
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Fukumi K
National Inst. Advanced Industrial Sci. And Technol. Jpn
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澤田 嗣郎
東大院工
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UENO Nobuo
Department of Materials Technology, Faculty of Engineering, Chiba University
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Ueno Nobuo
Department Of Applied Physics Tohoku University
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Ueno Nobuo
Department Of Materials Science Faculty Of Engineering Chiba University
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YAMASHITA Yoshio
SORTEC Corporation
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KAI Hisashi
Faculty of Engineering, Yokohama National University
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Kim Y‐j
Tokai Univ. Shizuoka Jpn
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Kataoka Y
Toshiba Corp. Yokohama Jpn
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Tsuboi S
Assoc. Super‐advanced Electronics Technol. (aset) Kanagawa Jpn
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Watanabe Tetsu
Components Development Group Sony Corporation
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Suzuki Kenji
Institute For Material Resezrch Tohoku University
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Ohtsuka K
Sanken Electric Co. Ltd. Niiza Jpn
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Fujiwara Koji
Department Of Applied Electronics Hokkaido Institute Of Technology
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HORIKOSHI Yoshiji
School of Science and Engineering, Waseda University
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KURIHARA Kenji
NTT LSI Laboratories
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MITSUGI Satoshi
NTT Basic Research Laboratories, NTT Corp.
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BAN Masahito
Superconductivity Research Laboratory,ISTEC
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BAN Masahito
Tamachi Laboratory, Superconductivity Research Laboratory, ISTEC
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HIRAYAMA Yoshiro
NTT Basic Research Laboratories, NTT Corporation
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Mitsugi Satoshi
Precision And Intelligence Laboratory Tokyo Institute Of Technology
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Yamashita Yohachi
Corporate R&d Center Toshiba Corporation
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Yamashita Yohachi
Toshiba Materials & Devices Research Laboratories
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Matsui Yasushi
Electronics Research Laboratory Corporate Research & Development Matsushita Electronics Corporat
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Matsui Y
Assoc. Super‐advanced Electronics Technol. (aset) Kanagawa Jpn
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Matsui Y
Nims Tsukuba Jpn
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SAWABE Atsuhito
Department of Electrical Engineering and Electronics, Aoyama-Gakuin University
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Kato T
Kddi R&d Laboratories Inc.
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Kajiwara Ken
Plasma Research Center University Of Tsukuba:(present)naka Fusion Research Establishment Japan Atomi
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Kurihara Kazuaki
Plasma Research Center University Of Tsukuba:(present) Japan Atomic Energy Research Institute
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MURAMATSU Shin-ichi
Central Research Laboratory
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Yamaguchi Yoh-ichi
Hoya Corporation
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TSUBOI Shinji
SORTEC Corporation
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Yamashita Yoshio
Sortec Corporation:(present Address) Oki Electric Industry Co. Ltd.
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Kurihara Kazuaki
Fujitsu Laboratories Inorganic Materials & Polymers Laboratory
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Horikoshi Yoshiji
School Of Science And Engineering Waseda University
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Fujinaga Masahiko
Kdd R & D Laboratories
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Kuriyama Hiroyuki
Sanyo Electric Co. Ltd.:giant Electronics Technology Co. Ltd.
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SUGITA Kazuyuki
Department of Materials Technology, Faculty of Engineering, Chiba University
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SAITO Ken
NTT Basic Research Laboratories
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SUZUKI Kyoichi
NTT Basic Research Laboratories
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MOMMA Naohiro
Hitachi Research Laboratory, Hitachi Ltd.
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GOTO Kenya
Department of Information and Communication Technology Tokai University
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MITSUGI Satoshi
Department of Information and Communication Technology Tokai University
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KURIHARA Kazuma
Department of Information and Communication Technology Tokai University
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FUJII Kiyoshi
Super-Fine SR Lithography Laboratory, Association of Super-Advanced Electronics Technologies
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MATSUI Yasuji
Super-Fine SR Lithography Laboratory, Association of Super-Advanced Electronics Technologies
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KURIYAMA Hiroaki
School of Science and Engineering, Waseda University
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ITO Masahiro
School of Science and Engineering, Waseda University
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Sawabe A
Aoyama‐gakuin Univ. Tokyo Jpn
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Sawabe Atsuhito
Department Of Electrical Engineering And Electronics Aoyama Gakuin University
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Muramatsu S
Univ. Tokyo Tokyo Jpn
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Matsui Y
Central Research Laboratory Hitachi Ltd.
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Goto K
Department Of Information And Communication Technology Tokai University
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藤井 研一
阪大院理
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水谷 直樹
川崎重工業株式会社:横浜国立大学大学院
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Matsui Yoshio
Department Of Cardiology Jichi Medical University School Of Medicine
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YAMAGUCHI Hiroshi
NTT Basic Research Laboratories
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MATSUDA Akihisa
Electrotechnical Laboratory
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Ohtsuka M
Hitachi Ulsi Systems Co. Ltd. Tokyo Jpn
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TARAFDER Md.
Graduate School of Engineering, Yokohama National University
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鈴木 和夫
Faculty of Engineering, Yokohama National University
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Ohtsuka Masashi
Tamachi Laboratory Superconductivity Research Laboratory Istec
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Ahn Jinho
Microelectronics Research Laboratories Nec Corporation
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Fujii K
Osaka Univ. Osaka
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Noda S
Assoc. Super‐advanced Electronics Technol. (aset) Yokohama Jpn
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Noda Shoji
Toyota Central Research And Development Labs
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Tarafder Md.
Graduate School Of Engineering Yokohama National University
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Suzuki Kenji
The Research Institute For Iron Steel And Other Metals
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Fujiwara Koji
Department Of Physics Division Of Material Science Nagoya University
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MATSUO Yoshio
Department of Clinical Radiology, Graduate School of Medical Sciences, Kyushu University
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FUKUDA HIDEO
Department of Applied Microbial Technology, Kumamoto Institute of Technology
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MATSUO Tadashi
Toppan Printing Co., Ltd.
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TOKUNAGA Seiichi
Superconductivity Research Laboratory,ISTEC
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OHTSUKA Masashi
Superconductivity Research Laboratory,ISTEC
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Fukuda H
Tokyo Inst. Technol. Yokohama Jpn
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Matsuo Yoshio
Department Of Clinical Radiology Graduate School Of Medical Sciences Kyushu University
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Matsuo Y
Department Of Social And Environmental Medicine Course Of Social Medicine Osaka University Graduate
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Matsuo Tadashi
Toppan Printing Co. Lid.
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Yoshida Yoichi
The Institute Of Scientific And Industrial Research Osaka University
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朴 耿徳
横浜国立大学大学院
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鈴木 和夫
横浜大学工学部
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NAKASHIMA Hisao
The Institute of Scientific and Industrial Research, Osaka University
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Kim Young-Joo
Department of Agricultural Engineering, Chonbuk National University
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Kajiyama Hiroshi
Advanced Research Laboratory Hitachi Ltd.
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Yamada Yasusada
Advanced Research Institute Waseda University:advanced Science Research Center Japan Atomic Energy R
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Ohta Takayuki
Department Of Electronic Engineering Faculty Of Engineering Osaka University
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Yamashita Y
Power Supply Materials And Devices Laboratory Corporate R&d Center Toshiba Corporation
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Noda S
Assoc. Super‐advanced Electronics Technol. Kanagawa Jpn
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FUKUTOME Hidenobu
Fujitsu Laboratories Ltd.
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HASEGAWA Sigehiko
The Institute of Scientific and Industrial Research, Osaka University
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SATOH Akira
FUJITSU LABORATORIES LTD.
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SUGII Toshihiro
FUJITSU LABORATORIES LTD.
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YONEDA Hideo
Department of Public Health Osaka University Medical School
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Yoneda Hideo
Department Of Social And Environmental Medicine Course Of Social Medicine Osaka University Graduate
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Saitoh T
Faculty Of Technology Tokyo University Of Agriculture And Technology
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KATO Toshihiko
KDD R&D Laboratories, Inc.
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Taguchi Takao
Hoya Corporation:(present Address) Fujitsu Laboratories Ltd.
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Watanabe Takeshi
Central Research Laboratory, Hitachi,Ltd.
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OHTA Tsuneaki
Oki Electric Industry Co., Ltd.
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SHOKI Tsutomu
HOYA Corporation
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YOSHIHARA Takuya
NEC Corporation
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MITSUI Soichiro
NEC Corporation
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NODA Shuichi
Toppan Printing Co., Lid.
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SUZUKI Kazuo
SORTEC Corporation
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HOGA Hiroshi
Toppan Printing Co., Lid.
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SUZUKI Katsumi
NEC Corporation
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SUZUKI Katsumi
Microelectronics Research Laboratories, NEC Corporation
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Hoga Hiroshi
Toppan Printing Co. Lid.
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Hoga Hiroshi
Oki Electric Industry Co. Ltd.
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Ohta Tsuneaki
Optoelectronics Joint Research Laboratory
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Ohta Tuneaki
Oki Electric Industry Co. Ltd.
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Ohta Tsuneaki
Oki Ekectric Industry Co. Ltd.
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Ohta Tsuneaki
Oki Electric Industry Co. Ltd.
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Noda Shuichi
Association Of Super-advanced Electronics Technologies (aset):(present Address)vlsi R&d Center O
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Noda Syuichi
Oki Electric Industry Co. Ltd.
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SAKU Tadashi
NTT Basic Research Laboratories
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MITSUZUKA Tsutomu
Superconductivity Research Laboratory, ISTEC
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Mochizuki Yasuhiro
Hitachi Research Laboratory Hitachi Ltd.
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Mochizuki Yasuhiro
Hitachi Research Labolatory Hitachi Ltd.
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Yamashita Yasuharu
Synthetic Crystal Research Laboratory School Of Engineering Nagoya University
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Fukuda Hideo
Department Of Applied Microbial Technology The Kumamoto Institute Of Technolgy
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MATSUI Yoshio
Environmental Pollution Research Institute of Nagoya City
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Fujimoto Manabu
Superconductivity Research Laboratory-istec:(present Address)functional Devices Laboratories Sharp C
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ROSLUND Joran
NTT Basic Research Laboratories
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FUKUDA Takuya
Semiconducter Development Center, Hitachi Ltd.
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SHIMA Kenzou
Hitachi Works, Hitachi Ltd.
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FUJIWARA Kohji
Department of Applied Electronics, Hokkaido Institute of Technology
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KIMURA Naohito
Department of Applied Electronics, Hokkaido Institute of Technology
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HORIBE Takayuki
Department of Information and Communication Technology Tokai University
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Young-Joo KIM
Department of Information and Communication Technology, Tokai University
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NOMURA Mitsuru
Department of Information and Communication Technology, Tokai University
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CHIBA Masafumi
Department of Material Science and Technology, Tokai University
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ITO Masahiro
Kagami Memorial Laboratory for Materials Science and Technology, Waseda University
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HORIKOSHI Yoshiji
Kagami Memorial Laboratory for Materials Science and Technology, Waseda University
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Ohta T
Matsushita Electric Industrial Co. Ltd. Osaka Jpn
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Chiba Natsuyo
Research Laboratory For Advanced Technology Seiko Instruments Inc.
著作論文
- Free Surface Potential Flow around Multi-Hulls in Shallow Water Using a Potential Based Panel Method
- (4)3次元WIGに関する数値解析的研究 : 平成5年秋季講演論文概要
- Flat and Lateral High-T_c Superconducting Junctions Applied to Millimeter-Wave Mixer (Special Issue on Toward Digital and Analog Applications of Superconductors)
- Analysis of Non-Uniform Boron Penetration of Nitrided Oxide in PMOSFETs Considering Two-Dimensional Nitrogen Distribution
- Boron Penetration Enhanced by Gate Ion Implantation Damage in PMOSFETs
- Hydrogen-Enhanced Boron Penetration in PMOS Devices during SiO_2 Chemical Vapor Deposition
- Hydrogen-Enhancing Boron Penetration in P-MOS Devices during SiO_2 Chemical Vapor Deposition
- Boron Diffusion in Nitrided-Oxide Gate Dielectrics Leading to High Suppression of Boron Penetration in P-MOSFETs
- Boron Diffusion in Nitrided Oxide Gate Dielectrics Leading to High Suppression of Boron Penetration in P-MOSFETs
- Sb Multiple Ion Implanted Channel for Low V_, Deep Submicron SOI-pMOSFETs
- X-Ray Mask Distortion Induced in Back-Etching Preceding Subtractive Fabrication: Resist and Absorber Stress Effect
- Ultrahigh-Vacuum Electron Cyclotron Resonance-Plasma Chemical-Vapor-Deposited SiN_x Films for X-Ray Lithography Mask Membrane : As-Deposited Properties and Radiation Stability
- Electron and Hole Proximity Effects in the InAs/AlSb/GaSb System
- Optically Detected Cyclotron Resonance by Multichannel Spectroscopy
- High-Quality, High-Rate SiO_2 and SiN Films Formed by 400 kHz Bias Electron Cyclotron Resonance-Chemical Vapor Deposition
- Electrical Properties of Regrowth ZnSe Homointerfaces Formed by Molecular Beam Epitaxy
- Electrical Properties of ZnSe/ZnSe Homointerfaces Formed by MBE Regrowth Process
- Characterization of Epitaxial ZnSe/GaAs(100) Interface Properties and Their Control by (HF+Se)-Pretreatment
- Characterization and Control of MBE-ZnSe/GaAs(100) Substrate Interface and Regrown ZnSe/ZnSe Homointerface
- Microoptical Two-Dimensional Devices for the Optical Memory Head of an Ultrahigh Data Transfer Rate and Density Sytem Using a Vertical Cavity Surface Emitting Laser (VCSEL) Array
- Mask Error Factor in Proximity X-Ray Lithography
- Determination of the Facet Index in Area Selective Epitaxy of GaAs
- Fabrication of Micro-Pyramidal Probe Array with Aperture for Near-Field Optical Memory Applications
- Optimum Phase Condition for Low-Contrast X-Ray Masks
- Selective Growth of GaAs on GaAs (111)B Substrates by Migration-Enhanced Epitaxy
- Determination of the Facet Index in Area Selective Epitaxy of GaAs
- Classification of Inhomogeneities in Hydrogenated Amorphous Silicon
- Medium-Range Order of Amorphous Silicon Germanium Alloys : Small-Angle X-Ray Scattering Study
- Chemical Vapor Deposition of a-Si:H Films Utilizing a Microwave Excited Ar Plasma Stream
- Growth and Stability of H_2-Phthalocyanine Thin Films on MoS_2 Surfaces Studied by Means of Low-Energy Electron Transmission Spectroscopy
- Growth of Pb-Phthalocyanine Thin Films on MoS_2 Surfaces Studied by Means of Low-Energy Electron Transmission Spectroscopy
- 1-4 Application of Micro-Genetic Algorithm (μGA) to the Optimal Design of Lifting Bodies
- Effect of Ar + O_2 Plasma Etching on Microwave Characteristics of YBa_2Cu_3O_ Based Resonators
- Microwave Properties of Y_1Ba_2Cu_3O_ Step-Edge Josephson Junction Series Arrays
- Characteristics of YBCO Josephson Junction Prepared by a Focused Ion Beam Technique
- X-Band Mixing Performance of Y_1Ba_2Cu_3O_ Step-Edge Junction
- I-V Characteristic of YBCO Step-Edge Josephson Junction (Special Section on Superconducting Devices)
- Effects of Excited Species in Electron Cyclotron Resonance Plasma on SiN Film Resistivity
- 非突出型船首バルブによる漁船船型の改良
- Fabrication of Epitaxial Diamond Thin Film on Iridium
- Epitaxial Growth of Diamond on Iridium
- Age-related Change in Relationship between White Blood Cell Count and Some Features of the Metabolic Syndrome
- Association of Lifestyle with Serum Lipid Levels : a Study of Middle-Aged Japanese Men
- Body Mass Index as a Measure of Health Care for Japanese Male Office Workers
- The Incidence of Hyperuricemia and Correlated Factors in Middle-Ages Japanese Men
- Associations of Body Mass Index and Percentage Body Fat by Bioelectrical Impedance Analysis with Cardiovascular Risk Factors in Japanese Male Office Workers
- Relation of Body Weight Change to Changes in Atherogenic Traits, A Study of Middle-Aged Japanese Obese Male Office Workers
- Effects of Coffee Consumption against the Development of Liver Dysfunction:A4-Year Follow-Up Study of Middle-Aged Japanese Male Office Workers
- Lifestyle and the Development of Dyslipidemia : a 4-year Follow-up Study of Middle-aged Japanese Male Office Workers
- Serum Uric Acid : Correlation with Biological, Clinical and Behavioral Factors in Japanese Men
- Risk Factors for the Incidence of Aortic Stiffness by Serial Aortic Pulse Wave Velocity Measurement in Middle-aged Japanese men
- (2) 自由表面条件の非線形性を考慮したパネル法による非揚力体/揚力体解析 : 平成10年春季講演論文概要
- Effects of Applied Magnetic Fields on Silicon Oxide Films Formed by Microwave Plasma CVD : Nuclear Science, Plasmas and Electric Discharges
- Validity of the Conventional Indirect Methods Including Friedewald Method for Determining Serum Low-Density Lipoprotein Cholesterol Level: Comparison with the Direct Homogeneous Enzymatic Analysis
- Reactive Ion Etching of Sputtered PbZr_Ti_xO_3 Thin Films
- 非線形計画法による船型設計の基礎的研究-3-船型の平滑化を考慮した極小造波抵抗問題〔含 討論〕
- 非線形計画法による船型設計の基礎的研究-2-低速造波理論の応用および水槽試験による検証〔含 討論〕
- Application of Micro-Genetic Algorithm (μGA) to the Optimal Design of Lifting Bodies
- A High-Speed Remote Procedure Call Based on Adaptive Data Representation Conversion
- A Design Method of Distributed Telecommunication System Based on the ODP Viewpoint Approach (Special Issue on Distributed Architecture for Next Generation Communication Networks)
- (4)浮体模型まわりの自由表面流に及ぼす表面張力の影響に関する研究 : 平成8年秋季講演論文概要
- (12)サーフェイスパネル法によるセーリングヨットに働く流体力の計算 : 平成7年秋季講演論文概要