Noda Syuichi | Oki Electric Industry Co. Ltd.

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著作論文

Thermally Induced Structural Modification of Nanometer-Order Mo/Si Multilayers by the Spectral Reflectance of Laser-Plasma Soft X-Rays
Single-Shot Measurement of Spectral Reflectance of a Soft X-Ray Multilayer Mirror Using a Laser-Plasma X-Ray Source
Plasma-Wall Interactions in Dual Frequency Narrow-Gap Reactive Ion Etching System
Internal Stress of CoSi_2 Films Formed by Rapid Thermal Annealing
Stress Measurements in Silicon Substrates with TiSi_2 Patterns Using Raman Microprobe
Measurements of Reflection Coefficient of Ion Waves in an Ion Beam-Plasma System
Waveform of Linear Ion-Acoustic Waves Excited by a Mesh Grid
Reflection of Ion Waves from a Bipolar Electrode in an Ion Beam-Plasma System
X-Ray Mask Distortion Induced in Back-Etching Preceding Subtractive Fabrication: Resist and Absorber Stress Effect
Reduction of X-Ray Irradiation-Induced Pattern Displacement of SiN Membranes Usirng H^+ Ion Implantation Technique
CF and CF_2 Radical Densities in 13.56-MHz CHF_3/Ar Inductively Coupled Plasma(Nuclear Science, Plasmas, and Electric Discharges)
Improvement in Radiation Stability of SiN X-Ray Mask Membranes
A ^7Li-NMR Study on Spinel LiMn_2O_4 : the Evidence of an Aniferromanetic Transition at 〜40K
Observation of Polymer Alloy by Spectral Soft X-Ray Microscopy with Laser Plasma X-Ray Source
Lattice Location of ^N Atoms in SiC Analyzed by Nuclear Resonant Reaction
Laser Plasma Soft X-Ray Contact Microscopy of Polyrmer Composites
Structure Analysis of Nylon6-Clay Hybrid by Spectral Reflectance of Laser-Plasma Soft X-Rays

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