Sekine M | Association Of Super-advanced Electronics Technologies (aset):(present Address)process & Manufac

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著作論文

Plasma-Wall Interactions in Dual Frequency Narrow-Gap Reactive Ion Etching System
Zero-Field Magnetic Amplifying Magnetooptical System Applied to Next Generation "iD PHOTO" System
CF and CF_2 Radical Densities in 13.56-MHz CHF_3/Ar Inductively Coupled Plasma(Nuclear Science, Plasmas, and Electric Discharges)
Realistic Etch Yield of Fluorocarbon ions in SiO_2 Etch Process
Resist and Sidewall Film Rermoval after AT Reactive Ion Etching (RIE) Employing F+H_2O Downstream Ashing
Capability of Tera bps Ultrafast Rewritable Storage by Thermomagnetic Switching
A New High-Density Plasma Etching System Using A Dipole-Ring Magnet
Gate Oxide Breakdown Phenomena in Magnetron Plasma
Single Silicon Etching Profile Simulation
Radiation Damage Evaluation in Excimer Laser Beam Irradiation and Reactive Ion Etching
Josephson Junctions Using Polyimide Langmuir-Blodgett Films with a Nb/Au/PI/(Pb-Bi) Structure
Electrical Transport Properties of Josephson Junctions Using Polyimide Langmuir-Blodgett Films
Electrical Properties of Langmuir-Blodgett Films Sandwiched between Pb-Bi Superconducting Electrodes : Electrical Properties of Condensed Matter
Excimer Laser Photochemical Directional Etching of Phosphorous Doped Poly-Crystalline Silicon
Photo-Excited Etching of Poly-Crystalline and Single-Crystalline Silicon in Cl_2 Atmosphere

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