Okano Haruo | Toshiba Research and Development Center

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概要

• Okano Haruoの詳細を見る
• 同名の論文著者
• Toshiba Research and Development Centerの論文著者

関連著者

• HORIIKE Yasuhiro

  Toshiba Research and Development Center

• Okano Haruo

  Toshiba Research and Development Center

• Horiike Yasuhiro

  Faculty Of Engineering Hiroshima University

• Yamazaki Takashi

  Toshiba Research and Development Center

• 堀池 靖浩

  広島大工

• Okano H

  Applied Materials Japan Inc. Chiba Jpn

• Sekine M

  Association Of Super-advanced Electronics Technologies (aset):(present Address)process & Manufac

• SEKINE Makoto

  Toshiba VLSI Research Center

• Horiike Yasuhiro

  Department Of Materials Science The University Of Tokyo

• Horiike Yasuhiro

  National Inst. For Materials Sci. Ibaraki Jpn

• Horiike Yasuhiro

  Biomaterials Center National Institute For Materials Science

• Horiike Yasuhiro

  Department Of Electrical Engineering Hiroshima University

• Tokura Tsunemasa

  Tokuda Seisakusho

• HORIE Hiromichi

  Toshiba Research and Development Center

• HORIOKA Keiji

  The Institute of Scientific and Industrial Research, Osaka University

• Arikado T

  Semiconductor Leading Edge Technologies Inc.

• Okano Haruo

  Toshiba Research And Development Center Integrated Circuit Laboratory

• Okano Haruo

  Toshiba Research And Development Center Toshiba Corporation

• Horioka Keiji

  Ulsi Research Laboratories Research And Development Center Toshiba Corporation

• Horiike Yasuhiro

  Department Of Materials Engineering The University Of Tokyo

• Horiike Yasuhiro

  Department Of Electrical And Electronics Engineering Toyo University:department Of Materials Science

• Horiike Yasuhiro

  Toshiba Research And Development Center Integrated Circuit Laboratory

• Horiike Yasuhiro

  Toyo University

• ARIKADO Tsunetoshi

  Toshiba VLSI Research Center

• HORIOKA Keiji

  Toshiba VLSI Research Center

• Arikado Tsunetoshi

  Toshiba Research And Development Center Toshiba Corporation

• Horiike Yasuhiro

  Development Of Material Science School Of Engineering University Of Tokyo

• Horiike Yasuhiro

  Department Of Electrical & Electronics Engineering Toyo University

• Horiike Yasuhiro

  World Premier International (wpi) Research Center Initiative International Center For Materials Nano

• Arikado Tunetoshi

  Microelectronics Engineering Laboratory Semiconductor Company Toshiba Corporation

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著作論文

• Etching Characteristics of n^+ Poly-Si and Al Employing a Magnetron Plasma
• High-Rate Reactive Ion Etching of SiO_2 Using a Magnetron Discharge
• Reactive Ion Beam Etching of SiO_2 and Poly-Si Employing C_2F_6, SiF_4 and BF_3 Gases
• Si Etch Rate and Etch Yield with Ar^+/Cl_2 System
• Single Silicon Etching Profile Simulation
• Photo-Excited Etching of Poly-Crystalline and Single-Crystalline Silicon in Cl_2 Atmosphere

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