Yamazaki Takashi | Toshiba Research and Development Center
スポンサーリンク
概要
関連著者
-
HORIIKE Yasuhiro
Toshiba Research and Development Center
-
Yamazaki Takashi
Toshiba Research and Development Center
-
Okano Haruo
Toshiba Research and Development Center
-
Tokura Tsunemasa
Tokuda Seisakusho
-
HORIE Hiromichi
Toshiba Research and Development Center
-
Horiike Yasuhiro
Toshiba Research And Development Center Integrated Circuit Laboratory
-
Shibagaki Masahiro
Toshiba Research And Development Center Integrated Circuit Laboratory
-
Yamazaki Takashi
Toshiba Research And Development Center Integrated Circuit Laboratory
-
KURISAKI Tetsuo
Tokuda Seisakusho Co.
著作論文
- Etching Characteristics of n^+ Poly-Si and Al Employing a Magnetron Plasma
- High-Rate Reactive Ion Etching of SiO_2 Using a Magnetron Discharge
- Aluminum Reactive Ion Etching Employing CCl_4+Cl_2 Mixture