Horiike Yasuhiro | Department Of Materials Science The University Of Tokyo
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概要
関連著者
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Horiike Yasuhiro
Department Of Materials Science The University Of Tokyo
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Horiike Yasuhiro
Department Of Electrical Engineering Hiroshima University
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Horiike Yasuhiro
Department Of Materials Engineering The University Of Tokyo
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Horiike Yasuhiro
Department Of Electrical And Electronics Engineering Toyo University:department Of Materials Science
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Horiike Yasuhiro
Toshiba Research And Development Center Integrated Circuit Laboratory
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Horiike Yasuhiro
Toyo University
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Horiike Yasuhiro
Department Of Electrical & Electronics Engineering Toyo University
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Horiike Yasuhiro
Department Of Electrical & Electronics Engineering Tokyo University
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HORIIKE Yasuhiro
Department of Electrical Engineering, Toyo University
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堀池 靖浩
物質･材料研究機構
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Horiike Yasuhiro
Faculty Of Engineering Toyo University
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Horiike Yasuhiro
Toshiba Vlsi Research Center
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Horiike Yasuhiro
Department Of Materials Science University Of Tokyo
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HORIIKE Yasuhiro
Toshiba Research and Development Center
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一木 隆範
東洋大学・工
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ICHIKI Takanori
Department of Electrical & Electronics Engineering, Toyo University
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Sakaue Hiroyuki
Department Of Electrical Engineering Hiroshima University
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Ichiki Takanori
Department Of Electric And Electronic Engineering Toyo University
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Ichiki Takanori
Department of Bioengineering, Graduate School of Engineering, The University of Tokyo, Bunkyo, Tokyo 113-8656, Japan
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長崎 幸夫
東京理科大学 基礎工学部
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Shindo Haruo
Department Of Applied Physics Tokai University
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SAKAUE Hiroyuki
Department of Electrical Engineering, Hiroshima University
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ICHIHASHI Hideki
Faculty of Engineering, Hiroshima University
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Taino Mitsuhiko
Kek High Energy Accelerator Research Organization
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IKEGAMI Naokatsu
VLSI R〓D Center, Oki Electric Industry Co., Ltd.
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Shibata Kenji
Toshiba Research And Development Center
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OHMURA Yamichi
Toshiba Research and Development Center
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INOUE Tomoyasu
Toshiba Research and Development Center
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KATO Koichi
Toshiba Research and Development Center
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KASHIWAGI Masahiro
Toshiba Research and Development Center
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TANIGUCHI Kazutake
Department of Materials Science, School of Engineering, The University of Tokyo
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MATSUI Tetsuyuki
Department of Physical Science, Graduate School of Engineering Science, Osaka University
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Horiike Yasuhiro
Department Of Materials Engineering School Of Engineering The University Of Tokyo
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Horiike Yasuhiro
Faculty Of Engineering Hiroshima University
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Horiike Yasuhiro
Department Of Electrical Engineering Toyo University
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Okano Haruo
Toshiba Research and Development Center
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Matsui Toshiaki
Communication Research Laboratory Ministry Of Posts And Telecommunications
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Ichihashi Hideki
Faculty Of Engineering Hiroshima University
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Takayanagi Satoshi
Department Of Electrical Engineering Toyo University
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MORIKAWA Yasuhiro
Department of Electrical Engineering, Toyo University
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SHIBAYAMA Toshikazu
Department of Electrical Engineering, Toyo University
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ITA Hirotsugu
Department of Electrical Engineering, Toyo University
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Chang Hong-young
Department Of Physics Korea Advanced Institute Of Science And Technology
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堀池 靖浩
広島大工
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Seo Sang-hun
Department Of Physics Korea Advanced Institute Of Science And Technology
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Okano Haruo
Toshiba Research And Development Center Integrated Circuit Laboratory
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Matsui T
Department Of Systems Innovation Graduate School Of Engineering Science Osaka University
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Ohmura Yamichi
Toshiba R And D Center Tokyo Shibaura Electric Co. Ltd.
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KANAMORI Jun
VLSI R&D Center, Oki Electric Industry Co., Ltd.
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Kanamori J
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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Kanamori Jun
Vlsi R&d Center Oki Electric Industry Co. Ltd.
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LEE Pyung-Woo
Department of Physics, Korea Advanced Institute of Science and Technology
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KIM Sung-Sik
Department of Physics, Korea Advanced Institute of Science and Technology
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CHANG Choong-Seock
Department of Physics, Korea Advanced Institute of Science and Technology
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Matsui Takayuki
Vlsi R&d Center Oki Electric Industry Co. Ltd.
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Kim Sung-sik
Department Of Electrical And Computer Engineering Yonsei University
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Kim Sung-sik
Department Of Physics Korea Advanced Institute Of Science And Technology
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Lee Pyung-woo
Department Of Physics Korea Advanced Institute Of Science And Technology:hyundai Electronic Industry
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YOSHIKI Hiroyuki
Department of Electrical and Electronic Engineering, Tsuruoka National College of Technology
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Ichiki Takanori
Department Of Electrical Engineering Toyo University
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Ichiki Takanori
Department Of Electrical And Electronics Engineering Toyo University
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Nagata Akiyoshi
Faculty Of Engineering Hiroshima University
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Yabata Atsushi
VLSI Research and Development Center, Oki Electric Industry Co., Ltd, 550-1 Higashiasakawa, Hachioji
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Yabata Atsushi
Vlsi Research And Development Center Oki Electric Industry Co. Ltd.
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MORIMOTO Noboru
Department of Electrical Engineering, Hiroshima University
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Takasaki Minoru
Kek High Energy Accelerator Research Organization
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Yoshiki Hiroyuki
Tsuruoka National College Of Technology
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Yoshiki Hiroyuki
Department Of Electrical Engineering Tsuruoka National College Of Technology
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Ita Hirotsugu
Department Of Electrical Engineering Toyo University
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Morikawa Yasuhiro
Department Of Electrical Engineering Toyo University
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Arikado Tsunetoshi
Toshiba Research And Development Center Toshiba Corporation
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Taniguchi Kazutake
Department Of Materials Science School Of Engineering The University Of Tokyo
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Shibayama Toshikazu
Department Of Electrical Engineering Toyo University
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Shindo Haruo
Department Of Applied Physics
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KUSUNOKI Yasutomo
Faculty of Engineering, Hiroshima University
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Wada Toshiaki
Sumitomo Special Metals Co. Lid.
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FUKUSHIMA Nobuto
Citizen Watch Co., Ltd.
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KATAI Hiroaki
Toyo University
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Chang Choong-seock
Department Of Physics Korea Advanced Institute Of Science And Technology
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Ikegami Naokatsu
Vlsi R&d Center Oki Electric Industry Co. Ltd.
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Nakano Masayuki
Department Of Electrical Engineering Hiroshima University
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Ichihara Tsutomu
Department of Electrical Engineering, Hiroshima University
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Ichihara Tsutomu
Department Of Electrical Engineering Hiroshima University
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Kusunoki Yasutomo
Faculty Of Engineering Hiroshima University
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Fukushima Nobuto
Citizen Watch Co. Ltd.
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Morimoto Noboru
Department Of Electrical Engineering Hiroshima University
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Lee Pyung
Department of Physics, Korea Advanced Institute of Science and Technology
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Taniguchi Kazutake
Department of Materials Engineering, School of Engineering, The University of Tokyo, 7-3-1 Hongo Bunkyo-ku, Tokyo 113-8656, Japan
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Yabata Atsushi
VLSI R&D Center, Electronic Devices Group, Oki Electric Industry Co., Ltd
著作論文
- Growth of Large Grained Silicon on Insulator by Electron Beam Annealing and Performance of MOS Devices : A-6: SILICON CRYSTALS
- Novel Micropaterned Surface Fabricated from Heterobifunctional Poly(ethylene glycol)/polylactide Block Copolymers for Patterned Cell Culture
- An atmospheric-pressure microplasma jet source for the optical emission spectroscopic analysis of liquid sample
- Localized and ultrahigh-rate etching of silicon wafers using atmospheric-pressure microplasma jets
- Etching Reactivity of Negative Ions Generated in Cl_2 Downstream Plasma
- A New Inside-Type Segmented Coil Antenna for Uniformity Control in a Large-Area Inductively Coupled Plasma
- Localized Removal of a Photoresist by Atmospheric Pressure Micro-plasma Jet Using RF Corona Discharge
- Si Etch Rate and Etch Yield with Ar^+/Cl_2 System
- Characteristics of Very High-Aspect-Ratio Contact Hole Etching
- Photoexcited Anisotropic Etching of Single-Crystalline Silicon
- Downstream Etching of Si and SiO_2 Employing CF_4/O_2 or NF_3/O_2 at High Temperature : Etching and Deposition Technology
- High-Rate and Smooth Surface Etching of Al_2O_3TiC Employing Inductively Coupled Plasma (ICP)
- Capacitively Coupled Microplasma Source on a Chip at Atmospheric Pressure : Nuclear Science, Plasmas, and Electric Discharges
- Si and SiO_2 Etching under Low Self-Bias Voltage
- Digital Chemical Vapor Deposition of SiO_2 Using a Repetitive Reaction of Triethylsilane/Hydrogen and Oxidation