Localized Removal of a Photoresist by Atmospheric Pressure Micro-plasma Jet Using RF Corona Discharge
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2002-09-15
著者
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堀池 靖浩
物質･材料研究機構
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HORIIKE Yasuhiro
Department of Electrical Engineering, Toyo University
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TANIGUCHI Kazutake
Department of Materials Science, School of Engineering, The University of Tokyo
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Horiike Yasuhiro
Faculty Of Engineering Toyo University
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Horiike Yasuhiro
Toshiba Vlsi Research Center
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Horiike Yasuhiro
Department Of Materials Science The University Of Tokyo
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Horiike Yasuhiro
Department Of Electrical & Electronics Engineering Tokyo University
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Horiike Yasuhiro
Department Of Materials Engineering School Of Engineering The University Of Tokyo
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Horiike Yasuhiro
Department Of Materials Science University Of Tokyo
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Horiike Yasuhiro
Department Of Electrical Engineering Hiroshima University
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Horiike Yasuhiro
Department Of Electrical Engineering Toyo University
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堀池 靖浩
広島大工
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YOSHIKI Hiroyuki
Department of Electrical and Electronic Engineering, Tsuruoka National College of Technology
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Horiike Yasuhiro
Department Of Materials Engineering The University Of Tokyo
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Horiike Yasuhiro
Department Of Electrical And Electronics Engineering Toyo University:department Of Materials Science
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Horiike Yasuhiro
Toshiba Research And Development Center Integrated Circuit Laboratory
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Horiike Yasuhiro
Toyo University
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Yoshiki Hiroyuki
Department Of Electrical Engineering Tsuruoka National College Of Technology
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Taniguchi Kazutake
Department Of Materials Science School Of Engineering The University Of Tokyo
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Horiike Yasuhiro
Department Of Electrical & Electronics Engineering Toyo University
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Taniguchi Kazutake
Department of Materials Engineering, School of Engineering, The University of Tokyo, 7-3-1 Hongo Bunkyo-ku, Tokyo 113-8656, Japan
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