Enhancement of Negative-Ion-Assisted Silicon Oxidation by Radio-Frequency Bias
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1999-12-01
著者
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堀池 靖浩
物質･材料研究機構
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Fujii Takashi
Department Of Cardiology Hiroshima General Hospital
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KUSABA Kouta
Department of Applied Physics, Tokai University
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Shindo H
Tokai Univ. Hiratsuka Jpn
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Shindo H
Yamaguchi Univ. Yamaguchi Jpn
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Shindo Haruo
Department Of Applied Physics Tokai University
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HORIIKE Yasuhiro
Department of Electrical Engineering, Toyo University
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Fujii Toru
General R&d Lab. Taiyo Yuden Co. Ltd.
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Kusaba K
Tokai Univ. Hiratsuka Jpn
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Kusaba Kouta
Department Of Applied Physics Tokai University
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Shindo H
Department Of Electronics Faculty Of Engineering Hiroshima University
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AOYAGI Hitoshi
Department of Applied Physics, Tokai University
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Aoyagi Hitoshi
Department Of Applied Physics Tokai University
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FUJII Takashi
Central Research Institute of Electric Power Industry
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Fujii T
Toyohashi Univ. Technol. Toyohashi Jpn
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Horiike Yasuhiro
Faculty Of Engineering Toyo University
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Horiike Yasuhiro
National Institute For Materials Science
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Horiike Yasuhiro
Toshiba Vlsi Research Center
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Horiike Yasuhiro
Department Of Electrical & Electronics Engineering Tokyo University
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Horiike Yasuhiro
Research Center For Integrated Systems Hiroshima University:(present Address)department Of Electrica
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Horiike Yasuhiro
Faculty Of Engineering Hiroshima University
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Horiike Yasuhiro
Department Of Electrical Engineering Hiroshima University
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Horiike Yasuhiro
Department Of Electrical Engineering Toyo University
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Fujii Toshio
Fujitsu Laboratories Lid.
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Fujii Toshio
Fujitsu Laboratories Limited
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Fujii T
Central Research Institute Of Electric Power Industry
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堀池 靖浩
広島大工
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Fujii Takashi
Exploratory Research Laboratories Fujisawa Pharmaceutical Co. Ltd.
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Shindo Haruo
Department Of Applied Physics
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Fujii Takashi
Department Of Applied Physics And Chemistry The University Of Electro-communications
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