Horiike Yasuhiro | Department Of Electrical & Electronics Engineering Tokyo University

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概要

• 同名の論文著者
• Department Of Electrical & Electronics Engineering Tokyo Universityの論文著者

関連著者

• Horiike Yasuhiro

  Department Of Electrical & Electronics Engineering Tokyo University

• Horiike Yasuhiro

  Department Of Electrical Engineering Toyo University

• Horiike Yasuhiro

  Faculty Of Engineering Hiroshima University

• 堀池 靖浩

  物質･材料研究機構

• Horiike Yasuhiro

  Faculty Of Engineering Toyo University

• Horiike Yasuhiro

  National Institute For Materials Science

• Horiike Yasuhiro

  Department Of Electrical Engineering Hiroshima University

• Horiike Yasuhiro

  Research Center For Integrated Systems Hiroshima University:(present Address)department Of Electrica

• HORIIKE Yasuhiro

  Department of Electrical Engineering, Toyo University

• Horiike Yasuhiro

  Toshiba Vlsi Research Center

• Horiike Yasuhiro

  Department Of Materials Science University Of Tokyo

• 堀池 靖浩

  物質・材料研究機構

• 堀池 靖浩

  科学技術振興事業団戦略的基礎研究推進事業 科学技術振興事業団

• Shindo H

  Department Of Electronics Faculty Of Engineering Hiroshima University

• Horiike Yasuhiro

  Department Of Materials Engineering School Of Engineering The University Of Tokyo

• Shindo H

  Tokai Univ. Hiratsuka Jpn

• Shindo H

  Yamaguchi Univ. Yamaguchi Jpn

• Shindo Haruo

  Department Of Applied Physics Tokai University

• Horiike Yasuhiro

  Department Of Materials Science The University Of Tokyo

• SAKAUE Hiroyuki

  Department of Electrical Engineering, Hiroshima University

• Shindo H

  Samsung Yokohama Res. Inst. Yokohama Jpn

• FUKASAWA Takayuki

  Department of Electrical Engineering, Hiroshima University

• ICHIKI Takanori

  Department of Electrical & Electronics Engineering, Toyo University

• Shingubara Shoso

  Department Of Applied Physics Tokyo Institute Of Technology:vlsi Research Center Toshiba Corporation

• Shindo Haruo

  Faculty of Agriculture, Yamaguchi University

• Takamura Yuzuru

  Department Of Materials Science School Of Engineering The University Of Tokyo

• ICHIKI Takanori

  the Department of Electric and Electronic Engineering, Tokyo University

• Horiike Yasuhiro

  National Inst. For Materials Sci. Ibaraki Jpn

• 高村 禅

  北陸先端科学技術大学院大学マテリアルサイエンス研究科

• 高村 禅

  北陸先端科学技術大学院大学

• 一木 隆範

  東洋大学・工

• 新宮原 正三

  Hiroshima University Graduate School Of Adsm

• 高村 禅

  北陸先端大

• Nakamura A

  Faculty Of Pharmacy And Parmaceutical Sciences Fukuyama University

• Baba Yoshinobu

  Department Of Applied Chemistry Graduate School Of Engineering Mext Innovative Research Center For P

• Narai Akira

  Faculty Of Engineering Hiroshima University

• 高井 まどか

  東京大学大学院工学系研究科マテリアル工学専攻

• 堀池 靖浩

  東京大学大学院工学系研究科

• Shingubara Shoso

  Department of Electrical Engineering, Hiroshima University

• SAKAUE Hiroyuki

  Graduate School of Advanced Sciences of Matter, Hiroshima University

• CHINZEI Yasuhiko

  Department of Electrical & Electronics Engineering, Tokyo University

• 堀池 靖浩

  (独)物質・材料研究機構

• 高井 まどか

  東大 大学院工学系研究科

• Horiike Yasuhiro

  Biomaterials Center National Institute For Materials Science

• Fukasawa Takayuki

  Faculty Of Engineering Fukuyama University:(present Address)2nd Development Engineering Dpt. Tokyo E

• Fujii Takashi

  Department Of Cardiology Hiroshima General Hospital

• Kubota Kazuhiro

  Department of Electrical Engineering, Hiroshima University

• NAKAMURA Akihiro

  Department of Electrical Engineering, Hiroshima University

• Fujii Toru

  General R&d Lab. Taiyo Yuden Co. Ltd.

• Ogawa Hiroki

  Precess Development Division C850 Fujitsu Limited

• Ueda Masanori

  Department Of Medicinal Chemistry Faculty Of Pharmaceutical Sciences The University Of Tokushima

• Baba Yoshinobu

  Department Of Applied Chemistry Graduate School Of Engineering Nagoya University

• KIKUCHI Toshiaki

  Department of Electrical & Electronics Engineering, Toyo University

• Kubota K

  Department Of Biological And Chemical Engineering Faculty Of Technology Gunma University

• Kikuchi T

  Department Of Applied Chemistry Faculty Of Science Science University Of Tokyo

• FUJII Syuitsu

  ADTEC Co., Ltd.

• FUJII Takashi

  Central Research Institute of Electric Power Industry

• Fujii Syuitsu

  Adtec Co. Ltd.

• Fujii T

  Toyohashi Univ. Technol. Toyohashi Jpn

• Kikuchi J

  Axiomatic Inc. Tokyo Jpn

• Fujii Toshio

  Fujitsu Laboratories Lid.

• Fujii Toshio

  Fujitsu Laboratories Limited

• 堀池 靖浩

  独立行政法人物質・材料研究機構

• Kikuchi Tsuneo

  Faculty Of Engineering Tokyo Institute Of Technology

• Fujii Sadao

  Central Research Laboratory Kanegafuchi Chemical Industry Co.

• 岡田 健一

  東京工業大学大学院理工学研究科電子物理工学専攻

• 益 一哉

  東京工業大学

• 加地 範匡

  名古屋大学

• 安井 隆雄

  名古屋大学

• 上田 正則

  Jst‐crest

• 岡本 行広

  名古屋大学

• 堀池 靖浩

  東大院工

• 高村 禅

  東京大学大学院工学研究科

• YAMAMOTO Jin

  Process Equipment Engineering Div., Canon Sales Co., Inc.

• 岡田 健一

  東京工業大学

• 小川 洋輝

  東京大学大学院工学系研究科

• JIWARI Nobuhiro

  Department of Electrical Engineering, Hiroshima University

• NARAI Akira

  Department of Electrical Engineering, Hiroshima University

• KOTO Makoto

  Department of Electrical Engineering, Hiroshima University

• HIROSE Masataka

  Department of Electrical Engineering, Hiroshima University

• SANO ATSUSHI

  Department of Cardiothoracic Surgery, The University of Tokyo Graduate School of Medicine

• Koto Makoto

  Department Of Electrical Engineering Hiroshima University

• Yamamoto J

  Process Equipment Engineering Div. Canon Sales Co. Inc.

• 上田 正則

  科技団・crest

• 渡慶次 学

  名古屋大学

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  名古屋大学

• 堂寺 知成

  放送大・埼玉

• 堂寺 知成

  京大院工

• ASAMI Kumiko

  The Institute of Scientific and Industrial Research, Osaka University

• IKEGAMI Naokatsu

  VLSI R〓D Center, Oki Electric Industry Co., Ltd.

• TANIGUCHI Kazutake

  Department of Materials Science, School of Engineering, The University of Tokyo

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  Research & Development Center, Shindengen Kogyo Corp.

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  Department of Materials Engineering, School of Engineering, The University of Tokyo

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  Process Development Division, Fujitsu Ltd.

• Fujimura Shuzo

  Precess Development Division C850 Fujitsu Limited

• Fujimura Shuzo

  Process Development Division Fujitsu Ltd.

• Fujimura Shuzo

  Process Development Div. C850 Fujitsu Ltd.

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  東京工業大学精密工学研究所

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  Department Of Electrical Engineering Toyo University

• 深澤 孝之

  東京大学大学院工学系研究科

• 岡本 行広

  名古屋大学大学院工学研究科化学・生物工学専攻

• 加地 範匡

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• 渡慶次 学

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• 馬場 嘉信

  名古屋大学大学院工学研究科化学・生物工学専攻

• 石原 一彦

  東京大学工学系研究科マテリアル工学専攻

• 高村 禅

  東大院工

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  東京大学大学院工学系研究科

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  徳島大薬

• Fujii Takashi

  Department Of Medicine And Clinical Science Yamaguchi University Graduate School Of Medicine

• 一木 隆範

  東京大学大学院工学系研究科 バイオエンジニアリング専攻

• 吉木 宏之

  鶴岡工業高等専門学校電気電子工学科

• 堂寺 知成

  放送大学埼玉学習センター

• UENO Nobuo

  Department of Materials Technology, Faculty of Engineering, Chiba University

• Ueno Nobuo

  Department Of Applied Physics Tohoku University

• Ueno Nobuo

  Department Of Materials Science Faculty Of Engineering Chiba University

• 葛巻 徹

  東京大学工学系研究科

• 葛巻 徹

  東京大学大学院工学系研究科

• KUSABA Kouta

  Department of Applied Physics, Tokai University

• SHINDO Haruo

  Department of Applied Physics, Tokai University

• KOROMOGAWA Takashi

  Department of Applied Physics, Tokai University

• 石川 賢司

  四日市大学総合政策学部

• 葛巻 徹

  東京大学大学院工学系研究科マテリアル工学専攻

• 沖 明男

  東京大学大学院工学系研究科

• 斧田 博之

  東京大学大学院工学系研究科

• OGAWA Hiroki

  Department of Surgery, Otsu Red Cross Hospital

• 菅原 弘雄

  東京工業大学精密工学研究所

• Koromogawa T

  Tokai Univ. Hiratsuka Jpn

• Koromogawa Takashi

  Department Of Applied Physics Tokai University

• YAMASHITA Akihito

  Department of Applied Physics, Tokai University

• Matsumoto Hiroyuki

  Department of Electrical Engineering, Toyo University

• FUKASAWA Takayuki

  2nd Development Engineering Dept., Tokyo Electron Yamanshi Limited

• NOUDA Tatuki

  Department of Electrical Engineering, Hiroshima University

• IWASAWA Hiroaki

  Department of Electrical Engineering, Hiroshima University

• SHOJI Tatsuo

  Plasma Science Center, Nagoya University

• Nagai Masao

  Adbic In. Corp. Ibaraki Jpn

• Aoki M

  Hitachi Ltd. Tokyo Jpn

• Aoki Masaru

  Department Of Chemistry Graduate School Of Arts And Sciences The University Of Tokyo

• Taino Mitsuhiko

  Kek High Energy Accelerator Research Organization

• Kusaba K

  Tokai Univ. Hiratsuka Jpn

• Kusaba Kouta

  Department Of Applied Physics Tokai University

• 吉木 宏之

  Tsuruoka National College Of Technology

• 葉山 哲也

  東大院・工

• 高村 禅

  東大院・工

• 堀池 靖浩

  東大院・工

• 馬場 嘉信

  科技団・CREST

• Aoki M

  Univ. Tokyo Tokyo Jpn

• KOBAYASHI YASUO

  Department of Dentistry Oral Surgery, Nagano Municipal Hospital

• Furukawa Masakazu

  Process Equipment Engineering Div. Cannon Sales Co. Inc.

• AOYAGI Hitoshi

  Department of Applied Physics, Tokai University

• OGATA Makoto

  Department of Electrical & Electronics Engineering, Tokyo University

• SUNADA Tsuyoshi

  Research and Development Division, ULVAC Japan Ltd.

• ITOH Masahiro

  Research and Development Division, ULVAC Japan Ltd.

• HAYASHI Toshio

  Research and Development Division, ULVAC Japan Ltd.

• ITATANI Ryohei

  Niihama National College of Technology

• KUROSAKI Ryo

  Manufacturing Technology Division, Fujitsu Ltd.

• KIKUCHI Jyun

  Manufacturing Technology Division, Fujitsu Ltd.

• FUKAZAWA Takayuki

  2nd Development Engineering Dpt, Tokyo Electron

• KIZUKA Tokushi

  Department of Applied Physics, School of Engineering, Nagoya University

• Aoyagi Hitoshi

  Department Of Applied Physics Tokai University

• HAYAMA Tetsuya

  Department of Materials Science, School of Engineering, The University of Tokyo

• TAKAI Madoka

  Department of Materials Engineering, The University of Tokyo

• KIKUCHI Jun

  Axiomatic Inc.

• YANAGISAWA Michihiko

  Speedfam Co., Ltd.

• NAKAGAWA Hideo

  Semiconductor Company, Matsushita Electric Industrial Co. Ltd.

• OKI Akio

  the Department of Materials Science, The University of Tokyo

• TAKAMURA Yuzuru

  the Department of Materials Science, The University of Tokyo

• FUKASAWA Takayuki

  the Department of Materials Science, The University of Tokyo

• OGAWA Hiroki

  the Department of Materials Science, The University of Tokyo

• HORIIKE Yasuhiro

  the Department of Materials Science, The University of Tokyo

• MATSUI Tetsuyuki

  Department of Physical Science, Graduate School of Engineering Science, Osaka University

• 新橋 里美

  科学技術振興事業団

• 小川 洋輝

  科学技術振興事業団

• 長井 政雄

  科学技術振興事業団

• KIKUCHI Jun

  Manufacturing Technology Division, Fujitsu Ltd.

• NAGASAKA Mitsuaki

  Manufacturing Technology Division, Fujitsu Ltd.

• YANO Hiroshi

  Manufacturing Technology Division, Fujitsu Ltd.

• Iida S

  Toyama Univ. Toyama Jpn

• Iida Shinya

  Speedfam Co. Ltd.

• 沖 明男

  (独)物質・材料研究機構

• 小川 洋輝

  (独)物質・材料研究機構

• 百瀬 俊

  ローム(株)

• 横川 昭徳

  ローム(株)

• Nagasaka Mitsuaki

  Manufacturing Technology Division Fujitsu Ltd.

• Harada Y

  Univ. Tokyo Tokyo Jpn

• Harada Yoshinao

  Ulsi Process Technology Development Center Matsushita Electronics Corporation

• Harada Yoshinao

  Ulsi Process Technology Development Center Matsushita Electronics Corp.

• HARADA Yoshiya

  Department of Materials Science, Faculty of Engineering, Chiba University

• 一木 隆範

  東洋大学 工学部

• 田浦 了

  東洋大学 工学部

• 一木 隆範

  東洋大工

• Ogawa Hiroki

  Department Of Material Science School Of Engineering University Of Tokyo

• Matsui Toshiaki

  Communication Research Laboratory Ministry Of Posts And Telecommunications

• Ichihashi Hideki

  Faculty Of Engineering Hiroshima University

• Shingubara Shoso

  Department Of Electrical Engineering Hiroshima University

• Fukasawa Takayuki

  Department Of Materials Engineering The University Of Tokyo

• Kikuchi Jun

  Manufacturing Technology Division Fujitsu Ltd.

• Aoki Masaru

  Advanced Display Incorporated

• MORIKAWA Yasuhiro

  Department of Electrical Engineering, Toyo University

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著作論文

• ナノピラー構造体が電気浸透流に及ぼす影響の評価
• 極微量全血分離・分析を目指したヘルスケアチップの創製
• Negative Ion Assisted Silicon Oxidation in Downstream of Microwave Plasma
• Measurement of Fluorocarbon Radicals Generated from C_4F_8/H_2 Inductively Coupled Plasma : Study on SiO_2 Selective Etching Kinetics
• Microloading Effect in Highty Selective Si0_2 Contact Hole Etching Employing Inductively Coupled Plasma
• Effect of Magnetic Field to Etching Characteristics of Inductively Coupled Plasma ( Plasma Processing)
• High Rate and Highly Selective SiO_2 Etching Employing Inductively Coupled Plasma
• RF Self-Bias Characteristics in Inductively Coupled Plasma
• Al Etching Characteristics Ernploying Helicon Wave Plasma
• Si Etching Employing Steady-State Magnetron Plasma with Magnet at Anode Centered in a Cylindrical Reactor
• ナノポアを通過する長鎖DNAのイメージング解析 : DNAの核膜孔通過過程のモデリングを目指して
• 18pYF-11 マイクロ・ナノチップ中における長鎖DNAのダイナミクスの解析
• カーボンナノチューブフィールドエミッターのI-V特性と先端構造
• Gap-filling of Cu Employing Sustained Self-Sputtering with Inductively Coupled Plasma Ionization
• Enhancement of Negative-Ion-Assisted Silicon Oxidation by Radio-Frequency Bias
• Development and Plasma Characteristics Measurement of Planar-Type Magnetic Neutral Loop Discharge Etcher
• Highly Selective SiO_2/Si Etching and Related Kinetics in Time-Modulated Helicon Wave Plasma
• SiO_2 Etching Employing Inductively Coupled Plasma with Hot Inner Wall
• In-Situ X-Ray Photoelectron Spectroscopy of Reactive-Ion-Etched Surfaces of Indium-Tin Oxide Film Employing Alcohol Gas
• Fluorescence Emission Control of Long DNA Molecules Adsorbed on microelectrode Surfaces by External Voltage
• Molecular Detection in a Microfluidic Device by Streaming Current Measurements
• Translocation of a Long DNA Chain Passing Through a Nanofabricated Pore
• Study on Elemental Technologies for Creation of Healthcare Chip Fabricated on Polyethylene Terephthalate Plate
• A Study on Mechanism of Chemical Mechanical Polishing on Al and Cu Surfaces Employing In-situ Infrared Spectroscopy
• 多項目同時測定ヘルスケアチップ用マイクログルコースセンサーの創製
• Cleaning of Silicon Surfaces by NF_3-Added Hydrogen and Water-Vapor Plasma Downstream Treatment
• 高齢化社会の到来とヘルスケアチップの創製 : ドライエッチング技術の展開
• プラズマプロセスによるバイオチップの開発と展望
• 大気圧マイクロプラズマジェットの微細加工への応用
• VHF駆動によるマイクロプラズマの生成技術とマイクロ化学分析システムへの応用
• An atmospheric-pressure microplasma jet source for the optical emission spectroscopic analysis of liquid sample
• Localized and ultrahigh-rate etching of silicon wafers using atmospheric-pressure microplasma jets
• Etching Reactivity of Negative Ions Generated in Cl_2 Downstream Plasma
• Electron Energy Control in Inductively Coupled Plasma Employing Multimode Antenna
• Thin Film Detection Employing Frequency Shift in Sheath Current Oscillation
• Excitation of Sheath Oscillating Current by Superimposing Pulse Voltage
• Atomic Layer Controlled Digital Etching of Silicon : Etching and Deposition Technology
• Atomic Layer Controlled Digital Etching of Silicon
• Fabrication of Quartz Microcapillary Electrophoresis Chips Using Plasma Etching
• Gap-Filling of Cu Employing Self-Sustained Sputtering with ICP Ionization
• In-Situ Observation of Oxygen Exposed Hydrogen Terminated Silicon Surfaces
• Silicon Etching Employing Negative Ion in SF_6 Plasma
• Selective Processing of Individual Carbon-Nanotubes Using Atomic Force Microscopy Installed in Transmission Electron Microscope
• A New Inside-Type Segmented Coil Antenna for Uniformity Control in a Large-Area Inductively Coupled Plasma
• Localized Removal of a Photoresist by Atmospheric Pressure Micro-plasma Jet Using RF Corona Discharge
• 容量結合型大気圧マイクロプラズマ源
• 医療
• Development of Clinical Chips for Home Medical Diagnostics
• 在宅で健康診断できるヘルスケアチップの開発 (特集 診断バイオチップの未来)
• μ-TAS応用によるバイオセンサ式ヘルスケアチップ (特集 流体MEMSのすべて--マイクロ流体デバイスの応用展開とその実用化)
• 産学独連携により2009年115WのEUV光源を実現
• 無痛針採血による在宅健康診断チップ
• 医療用バイオチップの現状と将来展望
• B-5-145 in vivoワイヤレス通信チップ用送受信回路に関する研究(B-5.無線通信システムA(移動通信))
• B-1-16 in vivo ワイヤレス通信チップ用アンテナに関する研究 : 電磁波の人体透過特性
• Numerically Controlled Dry Etching Technology for Flattening of Si Wafer which Employs SF_6/H_2 Downstream Plasma
• Study on Reaction Mechanism of Aluminum Selective Chemical Vapor Deposition with In-situ XPS Measurement : Etching and Deposition Technology
• Study on Reaction Mechanism of Aluminum Selective Chemical Vapor Deposition with In-situ XPS Measurement
• Characteristics of Very High-Aspect-Ratio Contact Hole Etching
• Photoexcited Anisotropic Etching of Single-Crystalline Silicon
• High-Rate Bias Sputtering Filling of SiO2 Film Employing Both Continuous Wave and Time-Modulated Inductively Coupled Plasmas
• Miniaturized Capillary Electrophoresis Fabricated on Pyrex Glass Chips Using Deep Dry Etching and Anodic Bonding
• Localized Plasma Processing of Materials Using Atmospheric-Pressure Microplasma Jets
• Healthcare Chip for Checking Health Condition from Analysis of Trace Blood Collected by Painless Needle
• ナノ構造体を用いた無標識検出
• Electromigration Characteristics of Cu-Al Precipitate in AlCu Interconnection
• Sputtering of Aluminum Film Using Microwave Plasma with High Magnetic Field
• Gas Residence Time Effects on Plasma Parameters: Comparison between Ar and C4F8
• Capacitively Coupled Microplasma Source on a Chip at Atmospheric Pressure : Nuclear Science, Plasmas, and Electric Discharges
• Digital Chemical Vapor Deposition of SiO_2 Using a Repetitive Reaction of Triethylsilane/Hydrogen and Oxidation
• A Portable Biochemical Analysis System Integrated with Microcapillary Electrophoresis and Microplasma Emission Spectroscopy
• Etching Reactivity of Negative Ions Generated in Cl2 Downstream Plasma
• Biochip Which Examines Hepatic Function by Employing Colorimetric Method
• Mechanism of Cloudy Surface Generation on Si Wafer Employing Numerically Controlled Local Dry Etching (NC-LDE)
• Initiation of the Planarization of SiO2 Film Employing Anhydrous HF Gas
• A Model for Resolution Dependent Roughness Values Measured by an Optical Profiler for Specific Surfaces
• Study on the Mechanism of Silicon Chemical Mechanical Polishing Employing In Situ Infrared Spectroscopy
• Heliconwave Plasma Which Contains Negative Ion
• Generation of Integrated Atmospheric-Pressure Microplasmas
• Study on the Mechanisms of Chemical Mechanical Polishing on Copper and Aluminum Surfaces Employing In Situ Infrared Spectroscopy
• Conelike Defect in Deep Quartz Etching Employing Neutral Loop Discharge

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