Localized Plasma Processing of Materials Using Atmospheric-Pressure Microplasma Jets
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概要
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An atmospheric-pressure microplasma jet ($\mu$-PJ) using RF (13.56 MHz) corona discharge was generated at the tip of a stainless steel surgical needle of 0.4 mm outer diameter at a RF power of 6–14 W. The needle functions as both a powered electrode and a narrow nozzle. The $\mu$-PJ with a gas mixture of He/SF6/O2 was applied to localized Si etching. The etched profile exhibited an isotropic shape and the etch rate had a maximum value at the total gas flow rate of about 600 sccm and the SF6 concentration of 5%. The etch rate of 170 μm/min was obtained at a RF power of 14 W.
- 2003-06-15
著者
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Horiike Yasuhiro
Department Of Electrical & Electronics Engineering Tokyo University
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YOSHIKI Hiroyuki
Department of Electrical and Electronic Engineering, Tsuruoka National College of Technology
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IKEDA Koichi
Technical Office, Tsuruoka National College of Technology
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WAKAKI Akihiro
Uzen Parts
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TOGASHI Seisuke
Togashi Denshi Service
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Taniguchi Kazutake
Department Of Materials Science School Of Engineering The University Of Tokyo
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Ikeda Koichi
Technical Office, Tsuruoka National College of Technology, 104 Sawada, Inooka, Tsuruoka, Yamagata 997-8511, Japan
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Taniguchi Kazutake
Department of Materials Engineering, School of Engineering, The University of Tokyo, 7-3-1 Hongo Bunkyo-ku, Tokyo 113-8656, Japan
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Wakaki Akihiro
Uzen Parts, 6-44 Banba-cho, Tsuruoka, Yamagata 997-0035, Japan
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