Study on Reaction Mechanism of Aluminum Selective Chemical Vapor Deposition with In-situ XPS Measurement : Etching and Deposition Technology
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1991-01-31
著者
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HORIIKE Yasuhiro
Department of Electrical Engineering, Toyo University
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SAKAUE Hiroyuki
Department of Electrical Engineering, Hiroshima University
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Horiike Yasuhiro
Department Of Electrical & Electronics Engineering Tokyo University
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Horiike Yasuhiro
Faculty Of Engineering Hiroshima University
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Horiike Yasuhiro
Department Of Electrical Engineering Toyo University
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堀池 靖浩
広島大工
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Sakaue Hiroyuki
Department Of Electrical Engineering Hiroshima University
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Kawamoto Hideaki
Ulsi Device Development Laboratories Nec Corporation
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KAWAMOTO Hideaki
Department of Electrical engineering, Hiroshima University
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TAKEHIRO Shinobu
Department of Electrical engineering, Hiroshima University
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Takehiro S
Hiroshima Univ. Higashi‐hiroshima
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Takehiro Shinobu
Department Of Electrical Engineering Hiroshima University
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