Measurement of Fluorocarbon Radicals Generated from C_4F_8/H_2 Inductively Coupled Plasma : Study on SiO_2 Selective Etching Kinetics
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1995-04-30
著者
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新宮原 正三
Hiroshima University Graduate School Of Adsm
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Shindo H
Tokai Univ. Hiratsuka Jpn
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Shindo H
Yamaguchi Univ. Yamaguchi Jpn
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Shindo H
Samsung Yokohama Res. Inst. Yokohama Jpn
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HORIIKE Yasuhiro
Department of Electrical Engineering, Toyo University
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Shindo Haruo
Faculty of Agriculture, Yamaguchi University
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Kubota Kazuhiro
Department of Electrical Engineering, Hiroshima University
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Matsumoto Hiroyuki
Department of Electrical Engineering, Toyo University
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Shingubara Shoso
Department of Electrical Engineering, Hiroshima University
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Kubota K
Department Of Biological And Chemical Engineering Faculty Of Technology Gunma University
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Shindo H
Department Of Electronics Faculty Of Engineering Hiroshima University
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Shindo Haruo
Faculty Of Engineering Fukuyama University
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Horiike Yasuhiro
National Institute For Materials Science
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Horiike Yasuhiro
Department Of Electrical & Electronics Engineering Tokyo University
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Horiike Yasuhiro
Faculty Of Engineering Hiroshima University
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Horiike Yasuhiro
Department Of Electrical Engineering Toyo University
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Shingubara Shoso
Department Of Applied Physics Tokyo Institute Of Technology:vlsi Research Center Toshiba Corporation
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Shindo Haruo
Faculty Of Agriculture Nagoya University : (present Address) Faculty Of Agriculture Yamaguchi Univer
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堀池 靖浩
広島大工
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Kikukawa K
Semiconductor And Integrated Circuits Division Hitachi Ltd.
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Shindo Haruo
Faculty Of Agriculture Nagoya University
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Matsumoto Hiroyuki
Department Of Biochemistry And Molecular Biology University Of Oklahoma Health Sciences Center
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Matsumoto Hiroyuki
Department Of Biochemistry And Molecular Biology The University Of Oklahoma Health Sciences Center
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Shindo Haruo
Faculty of Engineering, Fukuyama University
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Kubota Kazuhiro
Department of Chemistry, Faculty of Engineering, Gunma University
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